公开(公告)号：NO168213B

公开(公告)日：1991-10-14

申请号：NO851973

申请日：1985-05-15

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED

IPC: G03C1/52 ,  G03C1/58 ,  G03C1/60

公开(公告)号：FI70090B

公开(公告)日：1986-01-31

申请号：FI820040

申请日：1982-01-07

Applicant: HOECHST AG

Inventor： THOESE KLAUS ,  FROMMELD HANS-DIETER ,  SCHELER SIEGFRIED

IPC: G03C1/52 ,  G03C1/60 ,  G03C1/76

Abstract: A two-component diazotype material, composed of a support and a light-sensitive layer which is applied thereto and contains a polymeric binder, a diazonium salt, a coupler, an acid stabilizer and conventional additives, wherein the support is a biaxially oriented polyester film and the polymeric binder comprises a mixture of about 10-60 percent by weight of a polymer or copolymer of vinyl acetate, for example, a copolymer of vinyl acetate and crotonic acid, and about 40-90 percent by weight of a cellulose ester, such as cellulose acetopropionate, cellulose acetobutyrate, cellulose propionate or cellulose butyrate.

公开(公告)号：ZA853737B

公开(公告)日：1986-01-29

申请号：ZA853737

申请日：1985-05-17

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED

IPC: G03C1/52 ,  G03C1/58 ,  G03C1/60 ,  G03C

公开(公告)号：ZA8503737B

公开(公告)日：1986-01-29

申请号：ZA8503737

申请日：1985-05-17

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED

IPC: G03C1/52 ,  G03C1/58 ,  G03C1/60 ,  G03C

CPC classification number: G03C1/58 ,  G03C1/52 ,  G03C1/60

公开(公告)号：FI851954A0

公开(公告)日：1985-05-16

申请号：FI851954

申请日：1985-05-16

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED

IPC: G03C1/52 ,  G03C1/58 ,  G03C1/60 ,  G03C

公开(公告)号：NO840851L

公开(公告)日：1984-09-10

申请号：NO840851

申请日：1984-03-06

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED

IPC: G03C1/54 ,  G03C

Abstract: Disclosed is a two-component diazotype material comprising a support and a light-sensitive layer containing (a) at least one diazonium compound derived from p-phenylenediamine and carrying a basic heterocyclic radical in the 4-position and ether groups in the 2- and 5-positions, (b) a coupler component, and (c) an acid stabilizer, the diazonium compound being present in the form of a benzenesulfonate or toluenesulfonate. The disclosed materials have a good storability and are easily developed.

公开(公告)号：CA2023067A1

公开(公告)日：1991-02-13

申请号：CA2023067

申请日：1990-08-10

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED ,  BUHR GERHARD ,  BERGMANN KLAUS

IPC: C07D303/22 ,  C07C303/06 ,  C07C303/22 ,  C07C303/28 ,  C07C303/32 ,  C07C309/26 ,  C07C309/50 ,  C07C309/52 ,  C09K9/02 ,  G03F7/022 ,  C07C309/53 ,  C07D303/36 ,  G03C1/54

Abstract: Substituted 1,2-naphthoquinone-2-diazide-4-sulfonic acids are disclosed having the general formula A A in which R is an alkyl, epoxyalkyl, alkylcarbonyl or alkylsulfonyl group, the carbon chains of which may be interrupted by oxygen atoms, or a substituted or unsubstituted aralkyl, arylcarbonyl or arylsulfonyl group and X is hydrogen, a metal or an ammonium group. A process for the preparation of the compounds is also disclosed. The compounds can be used as such, or preferably after condensation of their sulfonic acid chlorides with aromatic hydroxy compounds or amines to give the corresponding esters or amides, as light-sensitive compounds in radiation-sensitive mixtures or materials.

公开(公告)号：FI74825B

公开(公告)日：1987-11-30

申请号：FI840810

申请日：1984-02-29

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED

IPC: G03C1/52 ,  G03C1/60 ,  G03C1/61

公开(公告)号：FI69715C

公开(公告)日：1986-03-10

申请号：FI820041

申请日：1982-01-07

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED ,  THOESE KLAUS

IPC: G03C1/52 ,  G03C1/60 ,  G03C1/93 ,  G03C1/80 ,  G03C5/18 ,  G03C5/34 ,  G03F7/08

公开(公告)号：BR8502350A

公开(公告)日：1986-01-21

申请号：BR8502350

申请日：1985-05-17

Applicant: HOECHST AG

Inventor： SCHELER SIEGFRIED

IPC: G03C1/52 ,  G03C1/58 ,  G03C1/60 ,  G03C1/54