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    5.
    发明专利
    未知

    公开(公告)号：BR9501830A

    公开(公告)日：1996-03-05

    申请号：BR9501830

    申请日：1995-04-27

    Applicant: HOECHST AG

    Inventor： EICHHORN MATHIAS ,  BUHR GERHARD

    IPC: G03F7/004 ,  G03F7/00 ,  G03F7/016 ,  G03F7/039 ,  H01L21/027 ,  C08L25/18

    Abstract: A positive-functioning radiation-sensitive mixt. (A) is claimed, contg. (a) a polymeric binder with acid-labile gps., contg. units of formula (I), (II) and (III) and (b) a cpd. which forms a strong acid when irradiated; R OH (I), R -O-CO2OR (II), R -O-CH2-CHR -OH (III): R = opt. substd. Ph attached to a polymer main or side chain; R = 3-11C alkyl or alkenyl, or 7-11C aralkyl; R = H, opt. substd. alkyl or aryl, phthalimidomethyl, or -CH2OR (with R = H, or opt. substd. aliphatic, cycloaliphatic or aromatic gp.). Also claimed is a recording material with a substrate and a radiation-sensitive layer consisting of compsn. (A).

    RADIATION-SENSITIVE MIXTURE CONTAINING AN ACID GENERATOR AND A POLYMER WITH RECURRENT ORTHO-CARBOXYLIC ACID ESTER GROUPS
    7.
    发明专利
    RADIATION-SENSITIVE MIXTURE CONTAINING AN ACID GENERATOR AND A POLYMER WITH RECURRENT ORTHO-CARBOXYLIC ACID ESTER GROUPS 未知

    公开(公告)号：CA1133743A

    公开(公告)日：1982-10-19

    申请号：CA355539

    申请日：1980-07-04

    Applicant: HOECHST AG

    Inventor： BUHR GERHARD ,  RUCKERT HANS

    IPC: G03C1/72 ,  C08G65/16 ,  C08L69/00 ,  G03F7/004 ,  G03F7/022 ,  G03F7/038 ,  G03C1/68

    Abstract: Hoe 79/K 031 RADIATION-SENSITIVE MIXTURE AND PROCESS FOR THE PRODUCTION OF RELIEF IMAGES A radiation-sensitive mixture is described which contains (a) a compound which forms an acid under the action of actinic radiation, and (b) a polymeric compound having recurrent orthocarboxylic acid ester groupings, and which comprises a polymeric compound which is built up from recurrent units of the formula I: (I) wherein R1 is a hydrogen atom or an alkyl, cycloalkyl or aryl group, R2, R3 and R5 are identical or different and denote hydrogen atoms or alkyl or aryl groups, R4 denotes an alkylene group or - if a1 = a2 = 1 - also an alkyleneoxy group, it being possible for the alkylene groups to be interrupted by hetero-atoms or by unsaturated or cyclic groups, R6 denotes a hydrogen atom or a methyl group, a1 and a2 each denote 0, 1 or 2, a1 + a2 Hoe 79/K 031 denotes 1 or 2 and m denotes a number from 3 to 200. The mixtures are suitable for the production of reprographic materials, in particular printing plates, of high photosensitivity.

    LIGHT-SENSITIVE MIXTURE
    9.
    发明专利
    LIGHT-SENSITIVE MIXTURE 未知

    公开(公告)号：CA1113108A

    公开(公告)日：1981-11-24

    申请号：CA330337

    申请日：1979-06-22

    Applicant: HOECHST AG

    Inventor： BUHR GERHARD ,  RUCKERT HANS

    IPC: G03C1/72 ,  C08L61/00 ,  C08L61/04 ,  G03F7/022 ,  H01L21/027 ,  C07C143/68 ,  G03C1/10

    Abstract: A positive-working light-sensitive mixture for the preparation of printing plates, in particular planographic printing plates, and photoresists is described, which comprises an alkali-soluble binder, preferably a novolak, and an o-naphthoquinone diazide of the formula (I) in which R1, R1', R2 and R2' are identical or different and represent hydrogen, chlorine or bromine atoms, alkyl, alkoxy or alkoxyalkyl groups having 1 to 6 carbon atoms or alkenyl groups having 2 to 6 carbon atoms, R3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, an optionally substituted alkyl group, the carbon chain of which can be interrupted by ether oxygen atoms, an optionally substituted cycloalkyl group having 5 to 16 carbon atoms or an optionally substituted alkenyl group having 2 to 16 carbon atoms, n represents zero or an integer from 1 to 4 and D represents a 1,2naphthoquinone-2-diazide-sulfonyl group. The new naphthoquinone diazides are distinguished by a high solubility in organic solvents and by good reprographic properties.

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