2.
    发明专利
    未知

    公开(公告)号:DE4219544A1

    公开(公告)日:1993-11-11

    申请号:DE4219544

    申请日:1992-05-06

    Applicant: HOECHST AG

    Abstract: The invention relates to a process for the desensitisation of 1,2-naphthoquinone-2-diazide-sulphonic acid esters, which are processed especially to give radiation-sensitive coating solutions for semiconductor substrates or printing plate carrier materials. The reaction mixture originating from the preparation of the 1,2-naphthoquinone-2-diazide-sulphonic acid esters is treated with a polymeric organic desensitising agent. A desensitised mixture, consisting essentially of 1,2-naphthoquinone-2-diazide-sulphonic acid ester and a polymeric desensitising agent, is then precipitated from the mixture.

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