公开(公告)号：WO2017015191A1

公开(公告)日：2017-01-26

申请号：PCT/US2016/042740

申请日：2016-07-18

Applicant: HONEYWELL INTERNATIONAL INC.

Inventor： DUNLOP, John A. ,  HUBERT, Kevin T. ,  RUZICKA, Jacob C. ,  WRAGG, Andrew N.A. ,  BLONDELL, Michael D. ,  JARDEE, William P. ,  JOHN, Phillip F. ,  LARA, Edward P. ,  MEYER, Wayne D. ,  DAUB, Adam P. ,  BUCKHART, Scott A. ,  JUNTTILA, Travis C.

IPC: H01L21/02 ,  H01L21/203

CPC classification number: H01J37/00 ,  C23C14/34

Abstract: A high surface area coil for use with a physical vapor deposition apparatus comprising a first surface. At least a portion of the first surface has a macrotexture with a surface roughness between about 15 µm and about 150 µm. At least a portion of the first surface has a microtexture with a surface roughness between about 2 µm and 15 µm.

Abstract translation: 一种用于物理气相沉积设备的高表面积线圈，包括第一表面。 第一表面的至少一部分具有约15μm至约150μm之间的表面粗糙度的宏观纹理。 第一表面的至少一部分具有表面粗糙度在约2μm和15μm之间的微纹理。

公开(公告)号：EP3326196A1

公开(公告)日：2018-05-30

申请号：EP16828351.3

申请日：2016-07-18

Applicant: Honeywell International Inc.

Inventor： DUNLOP, John A. ,  HUBERT, Kevin T. ,  RUZICKA, Jacob C. ,  WRAGG, Andrew N.A. ,  BLONDELL, Michael D. ,  JARDEE, William P. ,  JOHN, Phillip F. ,  LARA, Edward P. ,  MEYER, Wayne D. ,  DAUB, Adam P. ,  BUCKHART, Scott A. ,  JUNTTILA, Travis C.

IPC: H01L21/02 ,  H01L21/203

CPC classification number: H01J37/3458 ,  C23C14/34 ,  C23C14/35 ,  H01F7/06 ,  H01F27/28 ,  H01J37/00

Abstract: A high surface area coil for use with a physical vapor deposition apparatus comprising a first surface. At least a portion of the first surface has a macrotexture with a surface roughness between about 15 μm and about 150 μm. At least a portion of the first surface has a microtexture with a surface roughness between about 2 μm and 15 μm.