公开(公告)号：KR20100089786A

公开(公告)日：2010-08-12

申请号：KR20100009895

申请日：2010-02-03

Applicant: HOYA CORP

Inventor： HIWATARI TADAO

IPC: H01L21/027 ,  B23Q3/08 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70908 ,  G03F7/20 ,  G03F7/70716 ,  G03F7/70925 ,  G03F7/70933 ,  G03F9/7096

Abstract: PURPOSE: A stage cleaner, a lithography apparatus, and a substrate processing apparatus are provided to maintain the gap between a plate and a stage by blowing gas between the plate and the stage. CONSTITUTION: A plate shape member has a through hole. The through hole is formed at the center of the plate(12). A rising apparatus lifts the plate. The plate is moved to a foreign material to remove the foreign material from the stage(10) on the end of the plate. An air is blown between the plate and the stage to maintain the cap between the plate and the stage constant.

Abstract translation: 目的：提供舞台清洁器，光刻设备和衬底处理设备，以通过在板和台之间吹送气体来保持板和台之间的间隙。 构成：板状构件具有通孔。 通孔形成在板（12）的中心。 升起的装置升起板。 将板移动到异物以从板的端部上的台（10）移除异物。 在板和台之间吹入空气，以将盖保持在板和台之间恒定。

公开(公告)号：JP2005164896A

公开(公告)日：2005-06-23

申请号：JP2003402690

申请日：2003-12-02

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： HIWATARI TADAO

IPC: G03F1/68 ,  G03F1/76 ,  G03F1/84 ,  G03F7/20 ,  H01L21/027 ,  G03F1/08

Abstract: PROBLEM TO BE SOLVED: To provide an optical head device which can prevent deposition of contaminations on the surface of an emission lens and decrease in the output of laser light for exposure, and keep favorable drawing accuracy, resolution or inspection capability.
SOLUTION: The device is provided with: a first air flow jetting means to jet gas downward through an air flow hole 6 formed on the lower face of a substrate part 3; and a second air flow jetting means to jet gas downward through a beam passing hole 5 where the exit lens 2 emits a light beam downward. A high-pressure gas layer is formed between an object 105 and the lower face of the substrate part 3 by the gas jetted by the first and second air flow jetting means, and the gap between the object 105 and the lower face of the substrate part 3 is kept constant by the equilibrium of the pressure and weight of the gas layer.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种可以防止污染物在发射透镜的表面上沉积并减少用于曝光的激光的输出的光学头装置，并且保持良好的绘制精度，分辨率或检查能力。 解决方案：该装置设置有：第一气流喷射装置，其通过形成在基板部分3的下表面上的气流孔6向下喷射气体; 以及第二气流喷射装置，用于将气体向下喷射通过出射透镜2向下射出光束的光束通过孔5。 通过由第一和第二气流喷射装置喷射的气体，在物体105和基板部分3的下表面之间形成高压气体层，并且物体105与基板部分的下表面之间的间隙 3通过气层的压力和重量的平衡保持恒定。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004333942A

公开(公告)日：2004-11-25

申请号：JP2003130633

申请日：2003-05-08

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： HIWATARI TADAO

IPC: G03F1/54 ,  G03F1/68 ,  G03F1/76 ,  G03F1/78 ,  G03F7/20 ,  H01L21/027 ,  G03F1/08

Abstract: PROBLEM TO BE SOLVED: To provide a method for drawing a pattern with high accuracy by suppressing fluctuation in the exposure light quantity caused by the difference in the output of energy beams when a pattern is drawn by multiple drawing (multi-path drawing).
SOLUTION: In the drawing method by using a raster scan system, the energy beams are made to scan by overlapping different stripes (paths) in the X direction for multiple drawing so as to obtain specified exposure light quantity by overlapping the beams. The multiple drawing is carried out based on the overlap of strips in the X direction which optimizes the exposure state of the resist layer in the region produced by overlapping.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种通过抑制当通过多次绘制绘制图案时由能量束的输出的差异引起的曝光量的波动而以高精度绘制图案的方法（多路径绘图 ）。 解决方案：在通过使用光栅扫描系统的绘图方法中，通过在X方向上重叠不同条纹（路径）进行多次绘制，使能量束进行扫描，以通过重叠光束来获得指定的曝光光量。 基于X方向上的条带的重叠进行多次绘制，其优化了通过重叠产生的区域中的抗蚀剂层的曝光状态。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2010204650A

公开(公告)日：2010-09-16

申请号：JP2010023078

申请日：2010-02-04

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： HIWATARI TADAO

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a stage cleaner surely reducing foreign matter on a stage used in a drawing apparatus, an inspection apparatus and the like.
SOLUTION: A clearance between a plate 12 and a stage 10 is kept constant by blowing gas between the plate 12 having a through-hole 11 and the stage 10 of the stage cleaner, and when the plate 12 is moved in this condition, foreign matter 13 on the stage 10 is removed by the edge of the plate 12. The stage cleaner can be installed to be used, for example, in the drawing apparatus and the like.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种阶段清洁器，可以确保减少在绘图装置，检查装置等中使用的台上的异物。 解决方案：通过在具有通孔11的板12和台架清洁器的台架10之间吹送气体，板12和台架10之间的间隙保持恒定，并且当板12在该状态下移动时， 台10上的异物13被板12的边缘除去。台式清洁器可以安装在例如绘图装置等中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2011158900A

公开(公告)日：2011-08-18

申请号：JP2011001453

申请日：2011-01-06

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： HIWATARI TADAO ,  TANAKA TOSHIYUKI

IPC: G03F1/36 ,  G03F1/76

Abstract: PROBLEM TO BE SOLVED: To form a pattern while applying distortion correction to each thin film, and accurately overlay these patters in a photomask having the pattern for transfer by patterning a plurality of thin films. SOLUTION: The method of manufacturing the photomask includes a first patterning process of forming a first pattern by applying a photolithography process to the first thin film formed on a transparent substrate, and a second patterning process of forming a second pattern by applying the photolithography process to the second thin film formed on the transparent substrate. The first patterning process includes a first drawing step, and the second patterning process includes a second drawing step. The first drawing step and second drawing step include drawing using a correction coordinate system subjected to the same distortion correction. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了对每个薄膜施加失真校正以形成图案，并且通过对多个薄膜进行图案化，将这些图案精确地覆盖在具有用于转印的图案的光掩模中。 解决方案：制造光掩模的方法包括通过对形成在透明基板上的第一薄膜施加光刻工艺来形成第一图案的第一图案化工艺，以及通过施加第二图案来形成第二图案 对在透明基板上形成的第二薄膜进行光刻处理。 第一图案化工艺包括第一拉丝步骤，第二图案化工艺包括第二拉伸步骤。 第一绘制步骤和第二绘制步骤包括使用经过相同失真校正的校正坐标系进行绘图。 版权所有（C）2011，JPO＆INPIT