公开(公告)号：AU2002311822A1

公开(公告)日：2002-11-25

申请号：AU2002311822

申请日：2002-04-15

Applicant: HRL LAB LLC

Inventor： KIRBY KEVIN W ,  BRAATZ PAUL O ,  SCHWARTZ ROBERT N

IPC: G01N27/22 ,  H01M8/04

Abstract: A method and sensor for determining the ratio of two components in a fluid mixture comprising a test cell in open communication with the fluid mixture and a reference cell containing a desired fluid mixture not in contact with the fluid mixture being tested, said reference and test cells having the same cell geometry. By use of a capacitance divider system, one determines the relative capacitances of said cells correlated with the dielectric constants of the respective fluid mixtures and ascertains the ratio of one component to the other component in the fluid mixture on the basis of the linear and monotonic correlation between the dielectric constant of the mixture at a given temperature and the ratio of one component to the other component. Preferably a mixture of methanol and water is tested such as for use as a feed to a reformer used in supplying hydrogen to a fuel cell. A fixed capacitor equivalent to the reference cell at a given temperature is usually substituted for the latter.

公开(公告)号：AU9089701A

公开(公告)日：2002-04-29

申请号：AU9089701

申请日：2001-09-13

Applicant: HRL LAB LLC

Inventor： KIRBY KEVIN W ,  PHELPS AMANDA C ,  SCHWARTZ ROBERT N

IPC: G01N1/00 ,  G01N21/35 ,  G01N21/61 ,  H01M8/04

Abstract: A method for detecting the presence and amount of carbon monoxide, comprising the use of infrared spectroscopy to compare the spectra of the test gas containing carbon monoxide and the reference gas. The reference gas is the test gas from which carbon monoxide had been removed by conversion using catalysts. The presence and quantity of carbon monoxide is determined by deducting the spectrum of the reference gas from the spectrum of the test gas. The catalysts comprise nanoparticles of gold precipitated on a metal oxide or hydroxide carrier. An apparatus implementing this method.

公开(公告)号：DE10196809T5

公开(公告)日：2004-04-15

申请号：DE10196809

申请日：2001-09-13

Applicant: HRL LAB LLC

Inventor： KIRBY KEVIN W ,  PHELPS AMANDA C ,  SCHWARTZ ROBERT N

IPC: G01N1/00 ,  G01N21/35 ,  G01N21/61 ,  H01M8/04

Abstract: A method for detecting the presence and amount of carbon monoxide, comprising the use of infrared spectroscopy to compare the spectra of the test gas containing carbon monoxide and the reference gas. The reference gas is the test gas from which carbon monoxide had been removed by conversion using catalysts. The presence and quantity of carbon monoxide is determined by deducting the spectrum of the reference gas from the spectrum of the test gas. The catalysts comprise nanoparticles of gold precipitated on a metal oxide or hydroxide carrier. An apparatus implementing this method.

公开(公告)号：AU7067700A

公开(公告)日：2001-06-06

申请号：AU7067700

申请日：2000-08-23

Applicant: HRL LAB LLC

Inventor： CHOW LAP-WAI ,  HSU TSUNG-YUAN ,  HYMAN DANIEL J ,  LOO ROBERT Y ,  OUYANG PAUL ,  SCHAFFNER JAMES H ,  SCHMITZ ADELE ,  SCHWARTZ ROBERT N

IPC: B81B3/00 ,  B81C1/00 ,  H01H1/021 ,  H01H1/58 ,  H01H49/00 ,  H01H59/00 ,  H01H50/00

Abstract: A microelectromechanical (MEM) switch is fabricated inexpensively by using processing steps which are standard for fabricating multiple metal layer integrated circuits, such as CMOS. The exact steps may be adjusted to be compatible with the process of a particular foundry, resulting in a device which is both low cost and readily integrable with other circuits. The processing steps include making contacts for the MEM switch from metal plugs which are ordinarily used as vias to connect metal layers which are separated by a dielectric layer. Such contact vias are formed on either side of a sacrificial metallization area, and then the interconnect metallization is removed from between the contact vias, leaving them separated. Dielectric surrounding the contacts is etched back so that they protrude toward each other. Thus, when the contacts are moved toward each other by actuating the MEM switch, they connect firmly without obstruction. Tungsten is typically used to form vias in CMOS processes, and it makes an excellent contact material, but other via metals may also be employed as contacts. Interconnect metallization may be employed for other structural and interconnect needs of the MEM switch, and is preferably standard for the foundry and process used. Various metals and dielectric materials may be used to create the switches, but in a preferred embodiment the interconnect metal layers are aluminum and the dielectric material is SiO2, materials which are fully compatible with standard four-layer CMOS fabrication processes.

公开(公告)号：WO03028059A8

公开(公告)日：2003-07-31

申请号：PCT/US0229629

申请日：2002-09-18

Applicant: HRL LAB LLC ,  UNIV CALIFORNIA

Inventor： SCHAFFNER JAMES H ,  TANGONAN GREGORY L ,  SCHWARTZ ROBERT N ,  WU MING ,  HSU TSUNG-YUAN ,  SCHMITZ ADELE E ,  LOO ROBERT Y

IPC: H01H1/20 ,  H01H59/00

CPC classification number: H01H59/0009 ,  H01G5/18 ,  H01G5/40 ,  H01H1/20 ,  H01H2059/0018 ,  H01H2059/0072 ,  H01H2059/0081

Abstract: A micro-electromechanical system (MEMS) switch (124) formed on a substrate (110), the switch comprising a transmission line (114) formed on the substrate, a substrate electrostatic plate (120) formed on the substrate, and an actuating portion (126). The actuating portion comprises a cantilever anchor formed on the substrate and a cantilevered actuator arm (130) extending from the cantilever anchor. Attraction of the actuator arm toward the substrate brings an electrical contact (134) into engagement with the portions of the transmission line (114) separated by a gap, thus bridging the transmission line gap and closing the circuit. In order to maximize electrical isolation between the transmission line (114) and the electrical contact (134) in an OFF-state while maintaining a low actuation voltage, the actuator arm (130) is bent such that the minimum separation distance between the transmission line (114) and the electrical contact (134) is equal to or greater than the maximum separation distance between the substrate electrostatic plate (120) and arm electrostatic plate (132).

Abstract translation: 形成在基板（110）上的微机电系统（MEMS）开关（124），所述开关包括形成在所述基板上的传输线（114），形成在所述基板上的基板静电板（120） （126）。 致动部分包括形成在基底上的悬臂锚杆和从悬臂锚杆延伸的悬臂致动器臂（130）。 致动器臂朝向基板的吸引使电触点（134）与由间隙分开的传输线（114）的部分接合，从而桥接传输线间隙并闭合电路。 为了在保持低致动电压的同时使OFF状态下的传输线（114）和电接触（134）之间的电隔离最大化，致动器臂（130）被弯曲，使得传输线 （114）和电触头（134）等于或大于基板静电板（120）和臂静电板（132）之间的最大间隔距离。

公开(公告)号：GB2390156A

公开(公告)日：2003-12-31

申请号：GB0308602

申请日：2001-09-13

Applicant: HRL LAB LLC

Inventor： KIRBY KEVIN W ,  PHELPS AMANDA C ,  SCHWARTZ ROBERT N

IPC: G01N1/00 ,  G01N21/35 ,  G01N21/61 ,  H01M8/04

Abstract: A method for detecting the presence and amount of carbon monoxide, comprising the use of infrared spectroscopy to compare the spectra of the test gas containing carbon monoxide and the reference gas. The reference gas is the test gas from which carbon monoxide had been removed by conversion using catalysts. The presence and quantity of carbon monoxide is determined by deducting the spectrum of the reference gas from the spectrum of the test gas. The catalysts comprise nanoparticles of gold precipitated on a metal oxide or hydroxide carrier. An apparatus implementing this method.

公开(公告)号：WO02093149A9

公开(公告)日：2004-04-29

申请号：PCT/US0212049

申请日：2002-04-15

Applicant: HRL LAB LLC ,  SCHWARTZ ROBERT N ,  BRAATZ PAUL O ,  KIRBY KEVIN W

Inventor： SCHWARTZ ROBERT N ,  BRAATZ PAUL O ,  KIRBY KEVIN W

IPC: G01N27/22 ,  H01M8/04

CPC classification number: H01M8/04089 ,  G01N27/221 ,  H01M8/04194

Abstract: A method and sensor for determining the ratio of two components in a fluid mixture comprising a test cell in open communication with the fluid mixture and a reference cell containing a desired fluid mixture not in contact with the fluid mixture being tested, said reference and test cells having the same cell geometry. By use of a capacitance divider system, one determines the relative capacitances of said cells correlated with the dielectric constants of the respective fluid mixtures and ascertains the ratio of one component to the other component in the fluid mixture on the basis of the linear and monotonic correlation between the dielectric constant of the mixture at a given temperature and the ratio of one component to the other component. Preferably a mixture of methanol and water is tested such as for use as a feed to a reformer used in supplying hydrogen to a fuel cell. A fixed capacitor equivalent to the reference cell at a given temperature is usually substituted for the latter.

Abstract translation: 一种用于确定包含与流体混合物开放连通的测试池的流体混合物中的两种组分的比例的方法和传感器，以及含有不与所测试的流体混合物接触的所需流体混合物的参考池，所述参考和测试池 具有相同的单元几何形状。 通过使用电容分配器系统，可以确定所述电池的相对电容与各流体混合物的介电常数相关，并且基于线性和单调相关性确定流体混合物中的一种组分与另一组分的比例 在给定温度下混合物的介电常数和一种组分与另一组分的比例。 优选地测试甲醇和水的混合物，例如用作用于向燃料电池供应氢气的重整器的进料。 在给定温度下等效于参考电池的固定电容器通常用于后者。

公开(公告)号：WO0233382A3

公开(公告)日：2002-08-15

申请号：PCT/US0128701

申请日：2001-09-13

Applicant: HRL LAB LLC ,  KIRBY KEVIN W ,  PHELPS AMANDA C ,  SCHWARTZ ROBERT N

Inventor： KIRBY KEVIN W ,  PHELPS AMANDA C ,  SCHWARTZ ROBERT N

IPC: G01N1/00 ,  G01N21/35 ,  G01N21/61 ,  H01M8/04 ,  G01N33/00

CPC classification number: G01N21/3504 ,  Y10T436/20 ,  Y10T436/205831

Abstract: A method for detecting the presence and amount of carbon monoxide, comprising the use ofinfrared spectroscopy to compare the spectra of the test gas containing carbon monoxide andthe reference gas. The reference gas is the test gas from which carbon monoxide had beenremoved by conversion using catalysts. The presence and quantity of carbon monoxide isdetermined by deducting the spectrum of the reference gas from the spectrum of the test gas.The catalysts comprise nanoparticles of gold precipitated on a metal oxide or hydroxide carrier.An apparatus implementing this method.

Abstract translation: 一种检测一氧化碳的存在和量的方法，包括使用红外光谱法比较含有一氧化碳和参照气体的测试气体的光谱。 参考气体是通过使用催化剂转化而除去一氧化碳的测试气体。 一氧化碳的存在和数量通过从测试气体的光谱中扣除参考气体的光谱来确定。催化剂包括在金属氧化物或氢氧化物载体上沉淀的金纳米颗粒。实施该方法的设备。

公开(公告)号：WO0135433A3

公开(公告)日：2001-12-27

申请号：PCT/US0023197

申请日：2000-08-23

Applicant: HRL LAB LLC

Inventor： CHOW LAP-WAI ,  HSU TSUNG-YUAN ,  HYMAN DANIEL J ,  LOO ROBERT Y ,  OUYANG PAUL ,  SCHAFFNER JAMES H ,  SCHMITZ ADELE ,  SCHWARTZ ROBERT N

IPC: B81B3/00 ,  B81C1/00 ,  H01H1/021 ,  H01H1/58 ,  H01H49/00 ,  H01H59/00 ,  H01H50/00

CPC classification number: B81C1/00246 ,  B81B2201/014 ,  B81C2201/014 ,  B81C2203/0714 ,  B81C2203/0735 ,  H01H1/58 ,  H01H59/0009 ,  H01H2001/0057

Abstract: A microelectromechanical (MEM) switch is fabricated inexpensively by using processing steps which are standard for fabricating multiple metal layer integrated circuits, such as CMOS. The exact steps may be adjusted to be compatible with the process of a particular foundry, resulting in a device which is both low cost and readily integrable with other circuits. The processing steps include making contacts for the MEM switch from metal plugs which are ordinarily used as viasto connect metal layers which are separated by a dielectric layer. Such contact vias are formed on either side of a sacrificial metallization area, and then the interconnect metallization is removed from between the contact vias, leaving them separated. Dielectric surrounding the contacts is etched back so that they protrude towards each other. Thus, when the contacts are moved towards each other by actuating the MEM switch, they connect firmly without obstruction. Tungsten is typically used to form vias in CMOS processes, and it makes an excellent contact material, but other via metals may also be employed as contacts. Interconnect metallization may be employed for other structural and interconnect needs of the MEM switch, and is preferably standard for the foundry and process used. Various metals and dielectric materials may be used to create the switches, but in a preferred embodiment the interconnect metal layers are aluminum and the dielectric material is SiO2, materials which are fully compatible with standard four-layer CMOS fabrication processes.

Abstract translation: 通过使用标准制造多个金属层集成电路（如CMOS）的处理步骤，廉价地制造了微机电（MEM）开关。 可以将精确的步骤调整为与特定代工厂的过程兼容，从而导致低成本且易于与其他电路集成的装置。 处理步骤包括从通常用作通过电介质层分离的永久连接的金属层的金属插头形成用于MEM开关的触点。 这种接触通孔形成在牺牲金属化区域的任一侧，然后从接触通孔之间移除互连金属化，使它们分开。 围绕触点的介质被回蚀，使得它们彼此突出。 因此，当通过致动MEM开关使触点彼此移动时，它们牢固地连接而不阻塞。 钨通常用于在CMOS工艺中形成通孔，并且它制成优良的接触材料，但也可以使用其它通孔金属作为接触。 互连金属化可以用于MEM开关的其他结构和互连需求，并且优选地是用于所使用的铸造和工艺的标准。 可以使用各种金属和介电材料来制造开关，但是在优选实施例中，互连金属层是铝，并且介电材料是SiO 2，与标准四层CMOS制造工艺完全兼容的材料。