公开(公告)号：DE3869468D1

公开(公告)日：1992-04-30

申请号：DE3869468

申请日：1988-05-06

Applicant: IBM

Inventor： AGOSTINO PETER A ,  BABU SURYADEVARA V ,  HOFFARTH JOSEPH G

IPC: C23C18/16 ,  C04B41/53 ,  C23C18/31 ,  C23C18/34 ,  C23C18/40 ,  G03F7/00 ,  G03F7/42 ,  H05K3/10 ,  H05K3/18 ,  H05K3/26 ,  H05K3/22 ,  B29C71/04 ,  H05K3/08 ,  H05K3/02

Abstract: Residual catalyst is removed from a dielectric substrate by exposing the substrate to a plasma formed from an inert gas.