公开(公告)号：EP1521797A4

公开(公告)日：2006-12-20

申请号：EP02765835

申请日：2002-07-11

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  ARIRAM ARI ,  GUARNIERI C RICHARD ,  HUANG WU-SONG ,  KWONG RANEE ,  MOREAU WAYNE M

IPC: C08G77/04 ,  C08K5/00 ,  B05D5/00 ,  B32B9/04 ,  C08G77/14 ,  C08G77/38 ,  C08J7/18 ,  C08K5/34 ,  C08K5/42 ,  C08L83/04 ,  C08L83/06 ,  G03C1/76 ,  G03F7/075 ,  G03F7/09 ,  H01L21/312 ,  H01L21/3213

CPC classification number: G03F7/091 ,  C08G77/04 ,  C08G77/38 ,  C08K5/3445 ,  C08K5/42 ,  C08L83/04 ,  C08L83/06 ,  C09D183/04 ,  G03F7/0752 ,  C08L2666/28 ,  C08L2666/36

Abstract: Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.

公开(公告)号：AU2002329596A1

公开(公告)日：2004-02-02

申请号：AU2002329596

申请日：2002-07-11

Applicant: IBM

Inventor： MOREAU WAYNE M ,  ANGELOPOULOS MARIE ,  ARIRAM ARI ,  GUARNIERI C RICHARD ,  HUANG WU-SONG ,  KWONG RANEE

IPC: C08K5/00 ,  B05D5/00 ,  B32B9/04 ,  C08G77/04 ,  C08J7/18 ,  C08L83/04 ,  G03C1/76 ,  H01L21/312 ,  H01L21/3213