公开(公告)号：JPH03147317A

公开(公告)日：1991-06-24

申请号：JP26323090

申请日：1990-10-02

Applicant: IBM

Inventor： REIDO SUTAATO BENETSUTO ,  ARUBAATO ROJIYAASU ERINGUBOO ,  JIYOOJI GOODON JIFUOODO ,  KAATO RINDOSEI HARAA ,  JIYON SURATON MATSUKIROTSUPU ,  GARII SUTEWAATO SERIN ,  JIYOSHII SHINGU

IPC: C23F4/00 ,  C23C16/44 ,  C23C16/515 ,  H01J37/32 ,  H01L21/302

Abstract: PURPOSE: To sweep/remove particle contamination material from plasma, by applying a transverse wave inductive force to plasma discharge. CONSTITUTION: A laser 38 generates a laser light ray 40, and it is scanned with a mirror 39, of normal motor-driven, which is attached for scanning through a port 35 on a chamber wall surface 30 thus the inside of plasma processing device in the chamber wall surface 30 scan. With a detector 41 assigned in parallel to the second view port 35, the effectiveness of wave induction is judged by using the laser light ray, scattering from the laser light ray, detected with the detector 41, so that cleanness level for use of a device is judged. In order to generates spacer fluctuation in plasma electric potential required for sweep/removal of particle contamination material from the reaction vessel space in the chamber wall surface 30, just a low level microwave radiation is sufficient. As a means for inducing a transverse wave in process, sound wave, radiation pressure are also effective.