Patent search ap:("IBM") AND inv:"CHAO VIVIAN WEI-WEN" Page 1

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发明专利
A METHOD FOR PRODUCING A RESIST IMAGE INVOLVING THE USE OF POLYSTYRENE-TETRATHIAFULVALENE POLYMER AS A DEEP-ULTRAVIOLET PRINTING MASK 未知

公开(公告)号：DE3373560D1

公开(公告)日：1987-10-15

申请号：DE3373560

申请日：1983-11-24

Applicant: IBM

Inventor： CHAO VIVIAN WEI-WEN , KAUFMAN FRANK BENJAMIN , KRAMER STEVEN ROBERT , LIN BURN JENG

IPC: G03F7/26 , G03F7/038 , G03F7/095 , G03F7/20 , H01L21/027 , G03F7/10 , G03F7/02

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