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公开(公告)号：DE3171036D1
公开(公告)日：1985-07-25
申请号：DE3171036
申请日：1981-09-16
Applicant: IBM
Abstract: This invention relates to a high resolution video storage disk comprising a substrate and a film of a monofunctionalized substituted tetraheterofulvalene compound and a halocarbon deposited on said substrate.
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公开(公告)号：DE69611053T2
公开(公告)日：2001-05-10
申请号：DE69611053
申请日：1996-04-09
Applicant: IBM
Inventor： COLGAN EVAN GEORGE , HARPER JAMES MICKELL EDWIN , KAUFMAN FRANK BENJAMIN , MANNI MARGARET PAGGY , MELCHER ROBERT LEE , SPEIDELL JAMES LOUIS
IPC: G02F1/1335 , G02F1/1339 , G02F1/1343 , G02F1/136 , G02F1/1362 , G02F1/1368
Abstract: A reflective spatial light modulator array is described incorporating liquid crystal devices, mirrors, a semiconductor substrate, electrical circuits, and a reflector/absorber layer for blocking light. The invention overcomes the problem of shielding light from semiconductor devices, high optical throughput and contrast, pixel storage capacitance to hold the voltage across the liquid crystal device and precise control of the liquid crystal device thickness without spacers obscuring the mirrors.
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公开(公告)号：DE3066410D1
公开(公告)日：1984-03-08
申请号：DE3066410
申请日：1980-09-15
Applicant: IBM
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公开(公告)号：DE2823523A1
公开(公告)日：1978-12-14
申请号：DE2823523
申请日：1978-05-30
Applicant: IBM
Inventor： ENGLER EDWARD MARTIN , KAUFMAN FRANK BENJAMIN
Abstract: This invention is concerned with a reversible electrochromic display device wherein its electrochromic activity is derived from an electrochromic active molecules which are attached to a porous polymeric resin.
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公开(公告)号：CA2172751A1
公开(公告)日：1996-10-29
申请号：CA2172751
申请日：1996-03-27
Applicant: IBM
Inventor： COLGAN EVAN GEORGE , HARPER JAMES MCKELL EDWIN , KAUFMAN FRANK BENJAMIN , MANNY MARGARET PAGGI , MELCHER ROBERT LEE , SPEIDELL JAMES LOUIS
IPC: G02F1/1335 , G02F1/1339 , G02F1/1343 , G02F1/136 , G02F1/1362 , G02F1/1368 , G09G3/36
Abstract: A reflective spatial light modulator array is described incorporating liquid crystal devices, mirrors, a semiconductor substrate, electrical circuits, and a reflector/absorber layer for blocking light. The invention overcomes the problem of shielding light from semiconductor devices, high optical throughput and contrast, pixel storage capacitance to hold the voltage across the liquid crystal device and precise control of the liquid crystal device thickness without spacers obscuring the mirrors.
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Patent Agency Ranking
公开(公告)号：IT1149265B
公开(公告)日：1986-12-03
申请号：IT2597180
申请日：1980-11-14
Applicant: IBM
Inventor： ENGLER EDWARD MARTIN , KAUFMAN FRANK BENJAMIN , SCHROEDER ALBERT HENRY
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公开(公告)号：IT8025971D0
公开(公告)日：1980-11-14
申请号：IT2597180
申请日：1980-11-14
Applicant: IBM
Inventor： KAUFMAN FRANK BENJAMIN , ENGLER EDWARD MARTIN , SCHROEDER ALBERT HENRY
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公开(公告)号：DE69024263T2
公开(公告)日：1996-07-11
申请号：DE69024263
申请日：1990-03-07
Applicant: IBM
Inventor： CARR JEFFREY WILLIAM , DAVID LAWRENCE DANIEL , GUTHRIE WILLIAM LESLIE , KAUFMAN FRANK BENJAMIN , PATRICK WILLIAM JOHN , RODBELL KENNETH PARKER , PASCO ROBERT WILLIAM , NENADIC ANTON
IPC: C09G1/02 , H01L21/306 , H01L21/48 , H01L21/302
Abstract: Disclosed is a method of chem-mech polishing an electronic component substrate. The method includes the following steps; obtaining a substrate having at least two features thereon or therein which have a different etch rate with respect to a particular etchant; and contacting the substrate with a polishing pad while contacting the substrate with a slurry containing the etchant wherein the slurry includes abrasive particles, a transition metal chelated salt and a solvent for the salt. The chem-mech polishing causes the at least two features to be substantially coplanar. Also disclosed is the chem-mech polishing slurry.
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公开(公告)号：ES2080818T3
公开(公告)日：1996-02-16
申请号：ES90480031
申请日：1990-03-07
Applicant: IBM
Inventor： CARR JEFFREY WILLIAM , DAVID LAWRENCE DANIEL , GUTHRIE WILLIAM LESLIE , KAUFMAN FRANK BENJAMIN , PATRICK WILLIAM JOHN , RODBELL KENNETH PARKER , PASCO ROBERT WILLIAM , NENADIC ANTON
IPC: C09G1/02 , H01L21/306 , H01L21/48 , H01L21/302
Abstract: Disclosed is a method of chem-mech polishing an electronic component substrate. The method includes the following steps; obtaining a substrate having at least two features thereon or therein which have a different etch rate with respect to a particular etchant; and contacting the substrate with a polishing pad while contacting the substrate with a slurry containing the etchant wherein the slurry includes abrasive particles, a transition metal chelated salt and a solvent for the salt. The chem-mech polishing causes the at least two features to be substantially coplanar. Also disclosed is the chem-mech polishing slurry.
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公开(公告)号：BR9001091A
公开(公告)日：1991-03-05
申请号：BR9001091
申请日：1990-03-07
Applicant: IBM
Inventor： CARR JEFFREY WILLIAM , DAVID LAWRENCE DANIEL , GUTHRIE WILLIAM LESLIE , KAUFMAN FRANK BENJAMIN , PATRICK WILLIAM JOHN , RODBELL KENNETH PARKER , PASCO ROBERT WILLIAM , NENADIC ANTON
IPC: B24B37/00 , C09G1/02 , H01L21/304 , H01L21/306 , H01L21/48 , H01L21/302
Abstract: Disclosed is a method of chem-mech polishing an electronic component substrate. The method includes the following steps; obtaining a substrate having at least two features thereon or therein which have a different etch rate with respect to a particular etchant; and contacting the substrate with a polishing pad while contacting the substrate with a slurry containing the etchant wherein the slurry includes abrasive particles, a transition metal chelated salt and a solvent for the salt. The chem-mech polishing causes the at least two features to be substantially coplanar. Also disclosed is the chem-mech polishing slurry.
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