公开(公告)号：US3615471A

公开(公告)日：1971-10-26

申请号：US3615471D

申请日：1968-08-12

Applicant: IBM

Inventor： LENOBLE JEAN PAUL ,  ALBERT BERTRAND JACQUES ,  BOCHARD FRANCOIS G ,  COQUARD JACQUES A ,  NORTURE ROGER A

IPC: C23C18/16 ,  G03C1/62 ,  G03F1/54 ,  G03F7/00 ,  G03F7/04 ,  H01L21/00 ,  H05K3/00 ,  H05K3/18 ,  G03C5/00 ,  G03C11/00

CPC classification number: H05K3/185 ,  C23C18/1605 ,  G03C1/62 ,  G03F1/54 ,  G03F7/00 ,  G03F7/04 ,  H01L21/00 ,  H05K3/0002 ,  H05K2203/056

Abstract: A method of producing optical masks by coating one surface of a transparent plate with a photoresist layer containing, as an additive, a catalyst for subsequent electroless deposition. The photoresist layer is exposed to a light pattern which activates the conventional sensitizer contained in the photoresist layer to harden the photoresist in the exposed areas. The photoresist is then treated with a developer which removes the unexposed, unhardened areas, leaving a pattern corresponding to the light pattern of photoresist containing a catalyst for electroless deposition. The substrate is then treated with a conventional electroless deposition bath which selectively deposits the metal in the areas coated with the photoresist pattern.