1.
    发明专利
    未知

    公开(公告)号:BR8704474A

    公开(公告)日:1988-05-24

    申请号:BR8704474

    申请日:1987-08-31

    Applicant: IBM

    Abstract: A process for laminating discrete sections of a supported photosensitive layer (44) onto a continuing series of sheet substrates (22). Each substrate (22) is advanced to and through the nip (40) of heated application rolls (28), and a continuous length of the supported photosensitive layer (42, 44) is also supplied to the nip (40). When the substrate (22) reaches a first location positioned between the application rolls (28), all movement ceases except that the rolls (28) move from an inactive disengaged position toward the substrate (22) to an active position to cause pressure contact between the photosensitive layer (44) and the substrate (22) to thereby laminate the photosensitive layer (44) to the substrate (22). There is a pause for a predetermined period of time with the rolls (28) in the active positions before the substrate (22) is again advanced with the rolls (28) still in the active positions and the photosensitive layer (44) again supplied to the nip (40). When the substrate (22) reaches a second location, all motion ceases once again and there is another pause for another predetermined period of time with the rolls (28) in the active positions after which the rolls are withdrawn to an inactive position. During the second pause, a successive substrate (22) continues to advance toward the preceding stationary substrate (22). At appropriate times, the supported photosensitive layer (44) is trimmed from the laminated photosensitive layer (42). The resulting laminated substrate (22) is provided with well defined edges (74, 78) of the photosensitive layer (44) where it is firmly laminated to the substrate (22) along lines spaced from the leading and trailing edges (64, 66) of the substrate. This desirably results in an unlaminated margin (72, 76) adjacent the leading and trailing edges of the substrate.

    PROCESS OF LAMINATING
    2.
    发明专利

    公开(公告)号:CA1284938C

    公开(公告)日:1991-06-18

    申请号:CA547683

    申请日:1987-09-24

    Applicant: IBM

    Abstract: A process for laminating discrete sections of a supported photosensitive layer to a sheet substrate comprises advancing the substrate through a nip between converging surfaces of opposed heated application rolls together with a continuous length of the supported photosensitive layer. The advance of the substrate is interrupted when it reaches a first location between the application rolls as is the supply of the photosensitive layer. The converging surfaces of each of the application rolls are moved from an inactive disengaged position transversely toward the substrate to an active position to cause pressure contact between the photosensitive layer and the substrate whereby the photosensitive layer is laminated to the substrate. The substrate is again advanced with the application rolls in active position and the supple of the photosensitive layer resumed. The disclosed process avoids localized poor adhesion and the known problems stemming from that condition.

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