公开(公告)号：JPH05188593A

公开(公告)日：1993-07-30

申请号：JP10341192

申请日：1992-04-23

Applicant: IBM

Inventor： NOOMAN OORUDORITSUCHI KAADO JI ,  RICHIYAADO AREN DEI ,  RAMUKURISHIYUNA GOOSARU ,  DONARUDO HAAMAN GURAATSUERU ,  DEIBITSUDO JIYON RATSUSERU

IPC: G03F7/004 ,  G03F7/028 ,  G03F7/038 ,  G03F7/075 ,  H05K3/28

Abstract: PURPOSE: To provide an improved cationic polymerizable epoxy-base coating material capable of photoimaging. CONSTITUTION: This improved compsn. contains an epoxy resin system consisting essentially of about 10-80wt.% polyol resin as a condensation product of epichlorohydrin and bisphenol A and about 20-90wt.% epoxidized octafunctional bisphenol A-formaldehyde novolak resin or further contg. about 35-50wt.% epoxidized glycidyl ether of tetrabromobisphenol A if flame resistance is required and contains a cationic photoinitiator capable of initiating the polymn. of the epoxy resin system at the time of exposure with chemical radiation by about 0.1-15 pts.wt. per 100 pts.wt. of the resins. The epoxy resin system has light absorption of