公开(公告)号：DE2722557A1

公开(公告)日：1977-12-22

申请号：DE2722557

申请日：1977-05-18

Applicant: IBM

Inventor： DUKE PETER JAMES ,  LEFF JERRY ,  LICLICAN LEO CALICA ,  POWELL MARK VERNON

IPC: G11C11/14 ,  G03F7/00 ,  H01F10/18 ,  H01F10/193 ,  H01F41/14 ,  H01F41/34 ,  H01L21/027 ,  H01L21/28 ,  H05K3/10 ,  H05K3/24 ,  H01L21/88

Abstract: This single level masking process includes the use of two layers of a positive photoresist. A pattern is formed in the first layer of photoresist. This photoresist pattern is heated and polymerized to a degree which permits it to be resistant to attack when covered with a second layer of the same positive photoresist, that is, the first photoresist pattern will maintain its integrity. After the heat treatment, the first layer pattern is substantially insensitive to actinic radiation and is easily stripped with conventional solvents. A pattern is formed in a second layer of photoresist that is different from the pattern formed in the first layer. After a first metal is deposited on portions of the substrates exposed in the second layer pattern, the second layer pattern is removed. A second metal is deposited on the portions of the substrate exposed in the first layer pattern and then that pattern is removed.