HIGH DENSITY VERTICALLY STRUCTURED MEMORY

    公开(公告)号:CA1277031C

    公开(公告)日:1990-11-27

    申请号:CA534688

    申请日:1987-04-14

    Applicant: IBM

    Abstract: HIGH DENSITY VERTICALLY STRUCTURED MEMORY A dynamic random access memory is provided wherein each cell has a storage capacitor and switching device and a bit/sense line or plate located along a sidewall of a trench formed in a semiconductor substrate. In a more particular structure of the cell, the trench width defines the length of the switching device, with the storage capacitor and a highly conductive bit/sense line being formed along opposite sidewalls of the trench. In an array of such cells, the highly conductive bit/sense line or plate interconnecting a large number of the cells of the array extends continuously from cell to cell within the trench at a sidewall thereof. Likewise, the storage capacitors of these many cells have a highly conductive common plate extending continuously within the trench at the opposite sidewall. BU-9-85-004

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