公开(公告)号：DE69415577D1

公开(公告)日：1999-02-11

申请号：DE69415577

申请日：1994-03-17

Applicant: IBM

Inventor： BROCK PHILLIP JOE ,  FRANKLIN JACQLYNN ANN ,  SCHELLENBERG FRANKLIN MARK ,  TSAY JIUNN

IPC: G03F1/34 ,  G03F7/20 ,  G03F1/14

Abstract: A plurality of noncontiguous polygonal regions of phase-shifting material have edges spaced apart less than the distance at which images of said edges would separate. The edges of the regions of phase-shifting material have differing arbitrarily selectable angular orientations (nonparallel as well as parallel) on a nonphase-shifting material. The noncontiguous phase-shifting regions may be arranged in a matrix of parallel columns and rows to facilitate fabrication and facilitate writing of the phase-shifting regions in any arbitrary pattern on an image plane. At least one of the phase-shifting regions constitutes a connective phase-shifting region with edges spaced from edges of adjacent ones of the phase-shifting regions to create a pattern with a continuous body of photoresist covering areas corresponding to the phase-shifting regions upon exposure of the mask. The phase-shifting regions may have different transmission coefficients to provide differing degrees of transparency or different degrees of phase shift to provide differing degrees of image intensity.

公开(公告)号：DE69415577T2

公开(公告)日：1999-07-15

申请号：DE69415577

申请日：1994-03-17

Applicant: IBM

Inventor： BROCK PHILLIP JOE ,  FRANKLIN JACQLYNN ANN ,  SCHELLENBERG FRANKLIN MARK ,  TSAY JIUNN

IPC: G03F1/34 ,  G03F7/20 ,  G03F1/14

Abstract: A plurality of noncontiguous polygonal regions of phase-shifting material have edges spaced apart less than the distance at which images of said edges would separate. The edges of the regions of phase-shifting material have differing arbitrarily selectable angular orientations (nonparallel as well as parallel) on a nonphase-shifting material. The noncontiguous phase-shifting regions may be arranged in a matrix of parallel columns and rows to facilitate fabrication and facilitate writing of the phase-shifting regions in any arbitrary pattern on an image plane. At least one of the phase-shifting regions constitutes a connective phase-shifting region with edges spaced from edges of adjacent ones of the phase-shifting regions to create a pattern with a continuous body of photoresist covering areas corresponding to the phase-shifting regions upon exposure of the mask. The phase-shifting regions may have different transmission coefficients to provide differing degrees of transparency or different degrees of phase shift to provide differing degrees of image intensity.