公开(公告)号：US3900337A

公开(公告)日：1975-08-19

申请号：US45825474

申请日：1974-04-05

Applicant: IBM

Inventor： BECK WOLFGANG ,  BRUNNER FRIEDRICH C ,  FRASCH PETER U ,  IVANCIC BLANKA ,  SCHWERDT FRIEDRICH W ,  VOGTMANN THEODOR

IPC: G03F7/42 ,  H01L21/311 ,  H01L21/312 ,  C09K13/04

CPC classification number: G03F7/423 ,  H01L21/31133

Abstract: Layers of organic material, especially of polymerized photoresist, are removed by means of a mixture of an at least 95% H2SO4, and an at least 30% H2O2, at a ratio of at least 15:1 (referring to the anhydrous chemical substances). The H2O2 content of the aqueous H2O2 is to be in a ratio of at least 11:1 to the H2O content of the H2SO4. The cleaning effect is based on the dehydrating effect of the H2SO4, and the oxidizing effect of the H2O2.

公开(公告)号：CA1026220A

公开(公告)日：1978-02-14

申请号：CA199318

申请日：1974-05-08

Applicant: IBM

Inventor： BECK WOLFGANG ,  BRUNNER FRIEDRICH C ,  FRASCH PETER U ,  IVANCIC BLANKA ,  SCHWERDT FRIEDRICH W ,  VOGTMANN THEODOR

IPC: H05K3/06 ,  C23F1/44 ,  G03F7/42 ,  H01L21/027 ,  H01L21/30 ,  H01L21/308 ,  H01L21/311 ,  B08B3/08