公开(公告)号：DE3472836D1

公开(公告)日：1988-08-25

申请号：DE3472836

申请日：1984-01-17

Applicant: IBM

Inventor： BINDRA PERMINDER SINGH ,  DAVID ALLAN PHILLIP ,  GALASCO RAYMOND THOMAS ,  LIGHT DAVID NOEL

IPC: G01N27/416 ,  G01N27/46

Abstract: The concentration of at least one organic additive in a plating bath is determined by providing a polished and preplated cathode, a reference electrode and anode in an electrolytic copper plating bath, passing an electric current from the anode to the cathode; measuring the voltage difference between the cathode and reference electrode; and comparing the difference to values for known concentrations of the at least one organic additive.