公开(公告)号：JPH04327993A

公开(公告)日：1992-11-17

申请号：JP33464891

申请日：1991-12-18

Applicant: IBM

Inventor： FUADO IRAIASU DOUNII ,  GEERII UIRIAMU GURUUBU ,  RAABII SARAFU

IPC: B41N1/24 ,  B41C1/055 ,  B41M1/12 ,  G03F1/00 ,  G03F7/12 ,  H01L21/308 ,  H01L21/48 ,  H01L23/12 ,  H05K1/09 ,  H05K3/00 ,  H05K3/02 ,  H05K3/12

Abstract: PURPOSE: To provide a dry method for forming a pattern on a substrate. CONSTITUTION: The drying method comprises the steps of coating an unzippable polymer film with a small amount of desirable UV if required on a substrate, laser ablating the film into a desired pattern or mask, screening a conductive or resistive paste onto the substrate through the ablated features of the mask, heating the substrate and mask to the unzipping temperature of the mask, and vaporizing the mask and UV absorbing dye if present leaving behind the solid of the conductive or resistive paste adhered to the substrate in the desired pattern.