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公开(公告)号：FR2276610A1
公开(公告)日：1976-01-23
申请号：FR7516541
申请日：1975-05-21
Applicant: IBM
Inventor： GIPSTEIN EDWARD , HEWET WILLIAM A
Abstract: Electron beam positive resists are formed from terpolymers of (a) an alpha olefin, (b) sulfur dioxide, and (c) a compound selected from the group consisting of cyclopentene, bicycloheptene and methyl methacrylate. The terpolymers have the particular unexpected advantage of being resistant to cracking of the films.
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