-
公开(公告)号：SE359688B
公开(公告)日：1973-09-03
申请号：SE844871
申请日：1971-06-30
Applicant: IBM
Inventor： HORWATH R , SADAGOPAN V
Abstract: A mask for the manufacture of semiconductor and other very small components. The mask is comprised of patterns of multi-component oxides and fluorides, such as spinels, perovskites, and garnets. In general, the materials are harder than the components being manufactured and are opaque to the wavelength used in photoresist techniques, while being transparent to the visible wavelengths. Materials with an energy gap between approximately 2.8 eV and 5 eV satisfy these optical properties, a particular example being GaFeO3. These masks are not damaged by surface defects on the components and can be visually aligned.
Search Results
1
records
(took 0.017 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
