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    3.
    发明专利
    未知

    公开(公告)号：DE1521342A1

    公开(公告)日：1969-07-24

    申请号：DE1521342

    申请日：1966-12-22

    Applicant: IBM

    Inventor： BERGER SCOW KENNETH ,  PAUL ANDERSON JOSEPH ,  IRVING BERTELSEN BRUCE

    IPC: H01F41/22 ,  C23C13/02

    Abstract: 1,163,010. Magnetic structures. INTERNATIONAL BUSINESS MACHINES CORP. 23 Dec., 1966 [30 Dec., 1965], No. 57615/66. Heading H1H. [Also in Division C7] A thin magnetic film is deposited on a substrate, e.g. by vacuum evaporation, at above 300‹ C. in a non-oxidizing atmosphere in the presence of a magnetic field, and then exposed to an O 2 -containing atmosphere whilst maintaining the temperature above 300‹ C. The film may be of a Ni-Fe alloy containing 77-83% Ni and optionally 3% Co, and may be 900 A thick. The substrate may be glass or metal, e.g. Ag-Cu, and is first cleaned, baked in vacuo, and coated with SiO by vacuum evaporation. The magnetic film may be deposited at 305- 425‹ C. at a pressure of 1À5 x 10- 6 Torr in a magnetic field of 30 Oe. The O 2 atmosphere is created by leaking in dry air to a pressure of 2 to 8x 10-5 Torr, with the same temperature and magnetic field. The surface is said to be oxidized.

    4.
    发明专利
    未知

    公开(公告)号：DE1521800A1

    公开(公告)日：1969-10-16

    申请号：DE1521800

    申请日：1966-08-02

    Applicant: IBM

    Inventor： IRVING BERTELSEN BRUCE ,  EDWARD REIMER ARNOLD

    IPC: C23F1/02 ,  G03F7/095 ,  G03F7/20 ,  G11C11/06 ,  H05K3/06

    Abstract: 1,145,987. Etching. INTERNATIONAL BUSINESS MACHINES CORP. 8 Aug., 1966 [30 Aug., 1965], No. 35364/66. Heading B6J. A subject is etched by forming an original pattern, forming .at least two duplicate intermediate patterns from the original, forming at least two superimposed layers of photoresist on the subject, exposing, each layer through a different one of the intermediate patterns before the application of the next succeeding resist layer, the intermediate patterns being placed in register during exposure of the resist layers, developing the resist layers and etching the subject. The intermediate patterns, may be photographic negatives produced in an apparatus which is cleaned. between the production of eachnegative to rearrange the random position of dust. At least one more subject may be etched-by the above method, at least two super imposed layers of resist formed on another subject, each layer being. exposed: through a different. one of the first-mentioned subjects the resist layers developed- and the other subject etched. The subjects may be of metal on a glass base.

    6.
    发明专利
    未知

    公开(公告)号：DE1296672B

    公开(公告)日：1969-06-04

    申请号：DEI0032270

    申请日：1966-11-18

    Applicant: IBM

    Inventor： TE-FU CHANG PAUL ,  IRVING BERTELSEN BRUCE ,  JAMES KUMP HERBERT

    IPC: G11B11/105 ,  G02F1/22

    Abstract: 1,155,006. Recording and playback. INTERNATIONAL BUSINESS MACHINES CORP. 4 Nov., 1966 [19 Nov., 1965], No. 49544/66. Heading G5R. [Also in Division H3] A film of anisotropic magnetostrictive ferromagnetic material is mechanically stressed so as to rotate its anisotropy at selected data-storage locations. The film is subjected to a magnetic field of an intensity insufficient by itself to rotate the magnetic vector into a remanent direction but sufficient to do so in conjunction with the mechanical stressing, which is applied by the production of a temperature gradient in the film at the selected locations by means of a laser beam or a beam of low-energy electrons. Playback is effected by scanning with a laser beam and using the Kerr effect. The datastorage locations may be formed as discrete elements of film on a common substrate or as regions in a single film, and the film may be provided with a protective coating, e.g. of silicon monoxide.

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