Patent search ap:("IBM") AND inv:"JIYURII ROSUTEISURABU PARASHIC" Page 1

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发明专利
POLYIMIDE RESISTANT TO REACTIVE ION ETCHING, METHOD FOR MANUFACTURING SAME AND USE OF SAME 失效

公开(公告)号：JPH04366133A

公开(公告)日：1992-12-18

申请号：JP25357891

申请日：1991-10-01

Applicant: IBM

Inventor： EDOWAADO DAAKO BABIIKU , MAIKURU HATSUAKISU , JIYURII ROSUTEISURABU PARASHIC , JIEIN MAAGARETSUTO SHIYOO

IPC: C08G73/10 , C08G77/42 , C08G77/455 , C08L79/08 , C08L83/02 , C08L83/10 , C23F4/00

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