公开(公告)号：CA1055104A

公开(公告)日：1979-05-22

申请号：CA264834

申请日：1976-11-03

Applicant: IBM

Inventor： KO WEN-CHUANG ,  SAWATZKY ERICH

IPC: G01R19/08 ,  G01Q30/02 ,  G01R31/302 ,  G01T1/29 ,  G21K5/04 ,  H01J37/04 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265 ,  H01J9/42 ,  G01R19/00 ,  H01J37/00

Abstract: APPARATUS FOR MEASURING THE BEAM CURRENT OF CHARGED PARTICLE BEAM of the Invention In an ion implantation apparatus, a structure for measuring the beam current at the target wherein a Faraday Cage is formed by walls adjacent to and electrically insulated from the target in combination with the target, means for biasing the target at a negative potential, means for biasing the walls at ground potential and means for measuring the target current and the wall current and for combining the two to provide an accurate beam current measurement.

公开(公告)号：FR2335919A1

公开(公告)日：1977-07-15

申请号：FR7634519

申请日：1976-11-08

Applicant: IBM

Inventor： KO WEN-CHUANG ,  SAWATZKY ERICH

IPC: H01J37/04 ,  H01J37/12 ,  H01J37/30 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01L21/265 ,  G21K1/08 ,  G21K5/04 ,  H01L21/263 ,  H01L21/70

公开(公告)号：DE2647254A1

公开(公告)日：1977-06-16

申请号：DE2647254

申请日：1976-10-20

Applicant: IBM

Inventor： KO WEN-CHUANG ,  SAWATZKY ERICH

IPC: H01J37/04 ,  H01J37/12 ,  H01J37/30 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01L21/265

公开(公告)号：CA1061416A

公开(公告)日：1979-08-28

申请号：CA267642

申请日：1976-12-10

Applicant: IBM

Inventor： KO WEN-CHUANG ,  SAWATZKY ERICH

IPC: H01J37/04 ,  H01J37/12 ,  H01J37/30 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027 ,  H01L21/265 ,  B23K15/00 ,  H01J37/31

Abstract: A METHOD FOR VARYING THE DIAMETER OF A BEAM OF CHARGED PARTICLES of the Invention In the bombardment of targets with beams of charged particles, a method for varying and controlling the diameter of such beams by passing the beam through an envelope of conductive material; the envelope is spaced from and coaxial with the beam. A selected D.C. potential is applied to the envelope, and the beam diameter is controlled by changing this applied potential in a direction away from ground potential to increase the beam diameter or by changing the potential in a direction toward ground potential to decrease said beam diameter.

公开(公告)号：FR2331039A1

公开(公告)日：1977-06-03

申请号：FR7629489

申请日：1976-09-22

Applicant: IBM

Inventor： KO WEN-CHUANG ,  SAWATZKY ERICH

IPC: G01R19/08 ,  G01Q30/02 ,  G01R31/302 ,  G01T1/29 ,  G21K5/04 ,  H01J37/04 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265 ,  G21K5/00

公开(公告)号：DE2644688A1

公开(公告)日：1977-05-12

申请号：DE2644688

申请日：1976-10-02

Applicant: IBM

Inventor： KO WEN-CHUANG ,  SAWATZKY ERICH

IPC: G01R19/08 ,  G01Q30/02 ,  G01R31/302 ,  G01T1/29 ,  G21K5/04 ,  H01J37/04 ,  H01J37/244 ,  H01J37/317 ,  H01L21/265 ,  G01T1/16 ,  H01J3/08