Abstract:
A semiconductor two device memory cell is disclosed in which the two devices are complementary. The cell is best implemented in the integrated circuit environment and may be fabricated using well known non-complementary fabrication techniques. The cell incorporates a floating region or substrate - within - a substrate on which charge is stored in different amounts to achieve different potentials on the region thereby controlling, in one mode, the threshold of a field effect transistor of which the floating region forms a part. In a different mode, the floating region or substrate forms a drain or source region for a switching transistor which is formed in its own substrate. The latter substrate, which is formed from a semiconductor chip or wafer, besides forming the channel region of the switching transistor acts as a source for a sensing transistor which is formed by a region of opposite conductivity type in the floating region, the floating region and the substrate itself. The floating region is charged to one of two potentials when the floating region is a drain or source of the switching transistor and, the amount of current flow is controlled by the potential on the floating region when it operates as the substrate for the sensing transistor.
Abstract:
A semiconductor two device memory cell is disclosed in which the two devices are complementary. The cell is best implemented in the integrated circuit environment and may be fabricated using well known non-complementary fabrication techniques. The cell incorporates a floating region or substrate - within - a - substrate on which charge is stored in different amounts to achieve different potentials on the region thereby controlling, in one mode, the threshold of a field effect transistor of which the floating region forms a part. In a different mode, the floating region or substrate forms a drain or source region for a switching transistor which is formed in its own substrate. The latter substrate, which is formed from a semiconductor chip or wafer, besides forming the channel region of the switching transistor acts as a source for a sensing transistor which is formed by a region of opposite conductivity type in the floating region, the floating region and the substrate itself. The floating region is charged to one of two potentials when the floating region is a drain or source of the switching transistor and, the amount of current flow is controlled by the potential on the floating region when it operates as the substrate for the sensing transistor.