Method of selective chemical vapor deposition

    公开(公告)号:US3697343A

    公开(公告)日:1972-10-10

    申请号:US3697343D

    申请日:1970-12-16

    Applicant: IBM

    Abstract: TUNGSTEN AND OTHER REFRACTORY METALS SUCH AS MOLYBDENUM, TANTALUM, HAFNIUM, ZIRCONIUM, RHENIUM, ETC. AND METLLOIDS SUCH AS SILICONB ARE CAUSED TO BE DEPOSITED SELECTIVELY BY THE HYDROGEN REDUCTION OF THEIR FLUORIDES AND CHLORIDES. THE PROCESS IS TERMED SELECTICE-CHEMICAL VAPOR DEPOSITION SINCE THE METAL IS DEPOSITED ONLY ON PREPATTERNED AREAS OF A SUBSTRATE. THE SUBSTRATE IS SUITABLY A GLASS SUCH AS BOROSILICATE, BROALUMINO-SILICATE, PHOSPHO-ALUMINO-SILICATE, PHOSPHO-SILICATE OR A SODA-LIME GLASS. THE SELECTIVE CHEMICAL VAPOR DEPOSITION PROCESS OCCURS WHEN TWO SURFACES WITH DIFFERENT CHEMICAL REACTIVITIES ARE EXPOSED TO THE CHEMICAL VAPOR DEPOSITION ENVIRONMENT. THE PREPATTERNED AREAS PROVIDED ONE OF THESE SURFACES, SUCH AREAS COMPRISING A NUCLEATING LAYER OF A MATERIAL SUCH AS CHROMIUM, TUNGSTEN, MOLYBDENUM, COPPER,

    ALUMINUM, SILICON, SILICON DIOXIDE, ALUMINUM OXIDE, SILICON NITRILE, AND THE LIKE OR OF COMPOSITE LAYERS OF CHROMIUM-COPPER, CHROMIUM-COPPER-CHROMIUM, AND THE LIKE. THE OTHER SURFACE IS PROVIDED BY THE REMAINDER OF THE SURFACE, I.E. THE EXPOSED SURFACE OF THE SUBSTRATE. THE SURFACE PROVIDED BY THE PREPATTERNED AREA ACTS AS A METAL NUCLEATION SITE WHILE THE SUBSTRATE, I.E., THE GLASS SURFACE CHEMICALLY ERODES (ABLATES) AND THE METAL DOES NOT NUCLEATE THEREON. IN CONSIDERING THE MECHANISM OF THE INVENTURE PROCESS, THE DEPOSITION REACTIONS AND SIMULTANEOUS ABLATION REACTIONS ACTING IN CLOSE PROXIMITY ARE AN ESSENTIAL ELEMENT THEREOF.

    GRATING COUPLED WAVEGUIDE LASER APPARATUS

    公开(公告)号:CA1089966A

    公开(公告)日:1980-11-18

    申请号:CA287493

    申请日:1977-09-26

    Applicant: IBM

    Abstract: GRATING COUPLED WAVEGUIDE LASER APPARATUS An optical coupling arrangement is described. A semiconductor laser is provided having two opposite end faces perpendicular to the axis of the emission stimulated therein. A first reflective surface adjacent to and parallel with one of the end faces reflects back into the laser radiant energy tending to exit through the one laser end face. An optical wave guide is coupled to receive the radiant energy exiting from the face opposite the first reflective surface. A grating integral with the optical waveguide directs radiant energy out of the waveguide in the direction not parallel to the lasing axis. A mirror reflects radiant energy back through the waveguide and the laser to support the lasing action.

    8.
    发明专利
    未知

    公开(公告)号:FR2376537A1

    公开(公告)日:1978-07-28

    申请号:FR7736208

    申请日:1977-11-24

    Applicant: IBM

    Abstract: An optical assembly structure wherein miniature optical components such as lasers, modulators, lenses, thin-film and fiber-optic waveguides, and photodetectors are critically aligned and supported for coactive operation by means of two or more wafers which are formed with complementary grooves and mortises to support the loose optical components such as lenses and fiber-optic waveguides and to receive alignment rails to insure the relativity of the wafers, which also have formed integral therewith optical elements such as waveguides, modulators, and lasers, to produce an integrated optical assembly somewhat in the manner of an "optical bench," wherein the bench structure also provides an active optical element.

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