公开(公告)号：CA2090038A1

公开(公告)日：1992-04-25

申请号：CA2090038

申请日：1991-01-23

Applicant: IBM

Inventor： BAUM THOMAS H ,  LARSON CARL E ,  REYNOLDS SCOTT K

IPC: C07F1/08 ,  C07F1/10 ,  C07F9/02 ,  C07F9/50 ,  C07F15/00 ,  C23C16/18 ,  C23C16/48 ,  C23C16/50 ,  H01L21/285 ,  H05K3/40 ,  C07F1/00 ,  B05D3/00 ,  C23C4/02 ,  B01J19/12

Abstract: 2090038 9207971 PCTABS00013 Chemical vapor deposition precursors for depositing copper, silver, rhodium and iridium metals on substrates comprise ligand stabilized +1 metal beta-diketonate coordination complexes of said metals. Uses of such precursors in CVD processes are also provided.