公开(公告)号：JP2001249457A

公开(公告)日：2001-09-14

申请号：JP2001048407

申请日：2001-02-23

Applicant: IBM

Inventor： GEOFFREY DONALD GEROME ,  ALI AFUZARI-ARUDAKANI ,  TERESHITA OODONEZU GRAHAM ,  LAURA LOUIS KOSUBA

IPC: C08K5/00 ,  C08K5/3475 ,  C08L33/14 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a high resolution photoresist composition used under deep UV and usable together with an aqueous developing solution having high basicity. SOLUTION: The photoresist composition contains a methacrylate polymer resin having a phenol group, a crosslinker selected from glycoluril derivatives each capable of reacting with the resin in the presence of an acid catalyst, a photo-acid initiator and an organic solvent. The composition is particularly useful in the formation of a negative type image having a high resolution of