1.
    发明专利
    未知

    公开(公告)号:DE69024468D1

    公开(公告)日:1996-02-08

    申请号:DE69024468

    申请日:1990-10-18

    Applicant: IBM

    Abstract: An electron microscope which includes a detector (18) which is located in the magnetic field used to focus the primary electron beam onto the sample (10). The focussing magnetic field is used to energy-filter and/or energy analyze the scattered electrons without the need for additional equipment, such as a retarding-field energy filter. The magnetic field of the condenser-objective lens (or of any other type of magnetic lens) of the microscope provides the filtering and/or analyzing action, and the detector (18) can be located so as to collect only low-loss electrons.

    3.
    发明专利
    未知

    公开(公告)号:DE69024468T2

    公开(公告)日:1996-07-11

    申请号:DE69024468

    申请日:1990-10-18

    Applicant: IBM

    Abstract: An electron microscope which includes a detector (18) which is located in the magnetic field used to focus the primary electron beam onto the sample (10). The focussing magnetic field is used to energy-filter and/or energy analyze the scattered electrons without the need for additional equipment, such as a retarding-field energy filter. The magnetic field of the condenser-objective lens (or of any other type of magnetic lens) of the microscope provides the filtering and/or analyzing action, and the detector (18) can be located so as to collect only low-loss electrons.

    4.
    发明专利
    未知

    公开(公告)号:BR9201914A

    公开(公告)日:1993-01-12

    申请号:BR9201914

    申请日:1992-05-21

    Applicant: IBM

    Abstract: A multi-layered structure (10) and process for forming it are described, incorporating a single crystal substrate (12), a plurality of epitaxial layers (16, 18, 22, 40, 42, 44, 48) having graded composition wherein the layers have changing lattice spacings not exceeding about 2 percent per 100,0 nm of thickness whereby misfit dislocations (54 ... 59) are formed to relieve strain and then move to the edges of respective layers. The invention overcomes the problem of large numbers of misfit dislocations threading to the surface of the top layer, especially during device processing at at temperatures in a range from 700 to 900 degrees Celsius. Fully relaxed, incommensurate structures having low defect densities are obtained, where arbitrary combinations of materials can be used.

    LOW DEFECT DENSIRY/ARBITRARY LATTICE CONSTANT HETEROEPITAXIAL LAYERS

    公开(公告)号:CA2062134A1

    公开(公告)日:1992-12-01

    申请号:CA2062134

    申请日:1992-03-02

    Applicant: IBM

    Abstract: Y09-91-061 LOW DEFECT DENSITY/ARBITRARY LATTICE CONSTANT HETEROEPITAXIAL LAYERS of the Invention A multi-layered structure and process for forming it are described, incorporating a single crystal substrate, a plurality of epitaxial layers having graded composition wherein the layers have changing lattice spacings not exceeding about 2 percent per 1000.ANG. of thickness whereby misfit dislocations are formed to relieve strain and then move to the edges of respective layers. The invention overcomes the problem of large numbers of misfit dislocations threading to the surface of the top layer, especially during device processing at at temperatures in a range from 700 to 900 degrees Celsius. Fully relaxed, incommensurate structures having low defect densities are obtained, where arbitrary combinations of materials can be used.

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