REAL-TIME CONTROL OF CHEMICAL-MECHANICAL POLISHING PROCESSES USING A SHAFT DISTORTION MEASUREMENT.

    公开(公告)号:MY124028A

    公开(公告)日:2006-06-30

    申请号:MYPI20003025

    申请日:2000-07-03

    Applicant: IBM

    Abstract: A METHOD IS PROVIDED FOR DETECTING THE ENDPOINT OF A FILM REMOVAL PROCESS SUCH AS CHEMICAL-MECHANICAL POLISHING (CMP). THE PROCESS USES A DEVICE (10) HAVING A SHAFT (15), AND FRICTION IN THE FILM REMOVAL CAUSES TORQUE ON THE SHAFT. TWO AXIALLY DISPLACED REFLECTING PORTIONS (41, 42) ARE PROVIDED ON THE SHAFT. LIGHT (430, 440) REFLECTED FROM THESE PORTIONS GENERATES FIRST AND SECOND REFLECTED SIGNALS (71, 72), RESPECTIVELY. A PHASE DIFFERENCE BETWEEN THE REFLECTED SIGNALS IS DETECTED, AND AN OUTPUT SIGNAL (711) IS GENERATED IN ACCORDANCE THEREWITH. A CHANGE IN THE OUTPUT SIGNAL INDICATES A CHANGE IN DEFPRMATION OF THE SHAFT RESULTING FROM CHANGE IN THE TORQUE, THEREBY INDICATING THE ENDPOINT OF THE FILM REMOVAL PROCESS.(FIG 4)

    REAL-TIME CONTROL OF CHEMICAL-MECHANICAL POLISHING PROCESSES USING A SHAFT DISTORTION MEASUREMENT

    公开(公告)号:SG90146A1

    公开(公告)日:2002-07-23

    申请号:SG200003553

    申请日:2000-06-26

    Applicant: IBM

    Abstract: A method is provided for detecting the endpoint of a film removal process such as chemical-mechanical polishing (CMP). The process uses a device having a shaft, and friction in the film removal causes torque on the shaft. Two axially displaced reflecting portions are provided on the shaft. Light reflected from these portions generates first and second reflected signals, respectively. A phase difference between the reflected signals is detected, and an output signal is generated in accordance therewith. A change in the output signal indicates a change in deformation of the shaft resulting from change in the torque, thereby indicating the endpoint of the film removal process.

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