FIELD EFFECT TRANSISTOR
    1.
    发明专利

    公开(公告)号:JPH10256551A

    公开(公告)日:1998-09-25

    申请号:JP3989398

    申请日:1998-02-23

    Applicant: IBM

    Abstract: PROBLEM TO BE SOLVED: To provide a new FET (asymmetrical field effect transistor) with improved reliability and performance. SOLUTION: An asymmetrical field effect transistor includes a first region 54 to be a source, a second region 53 to be a drain, a thin gate oxide 52 and a gate electrode 51. The gate electrode is asymmetrical and one of its side wall is sloped. The second region 53 extends under the sloped side wall 56. The part of the second region 53 extending under the gate electrode 51 is doped more lightly than the rest of the second region 53. The second region 53 is further provided with a sloped junction edge 58 under the gate electrode 51.

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