公开(公告)号：DE3471404D1

公开(公告)日：1988-06-23

申请号：DE3471404

申请日：1984-06-28

Applicant: IBM

Inventor： CHOW MING-FEA ,  LOPATA ALEXANDER DANIEL ,  LYONS CHRISTOPHER FRANCIS ,  MCINTOSH ROBERT CHARLES ,  SCADUTO ANTHONY FRANCIS

IPC: H01L21/30 ,  G03C5/08 ,  G03F7/105 ,  G03F7/20 ,  H01L21/312 ,  G03F7/26 ,  G03F7/08 ,  G03C5/18 ,  G03B41/00

Abstract: A process for setting the exposure speed of photolithography instruments is described, using a method of dosimetry based on photoactive compound bleaching of photoresist. A curve of light absorbance to exposure speed and a calibration curve of light absorbance to dose are determined for a photoresist. The exposure speed for any desired degree of resist bleaching can be set using the first curve, and the exposure speed for a predetermined dosage can be set by determining the common light absorbance value on the exposure speed and dosage curves.