公开(公告)号：DE2752439A1

公开(公告)日：1978-06-08

申请号：DE2752439

申请日：1977-11-24

Applicant: IBM

Inventor： MADER SIEGFRIED ,  MASTERS BURTON JOSEPH ,  POGGE HANS BERNHARD

IPC: H01L21/265 ,  H01L29/167

公开(公告)号：DE1483246A1

公开(公告)日：1969-09-18

申请号：DE1483246

申请日：1965-08-28

Applicant: IBM

Inventor： MADER SIEGFRIED ,  STANLEY NOWICK ARTHUR ,  WIDMER HANS

IPC: B22D11/06 ,  C22C45/00 ,  C23C14/14 ,  C23C14/18 ,  C23C14/26 ,  C23C14/32 ,  C23C14/54 ,  H01B1/00 ,  H01C3/00 ,  H01F1/153 ,  H01L39/00 ,  H01V11/12

Abstract: An amorphous alloy which is metastable at room temperature and which includes two components which have a size factor in the range 10% to 25%, an insolubility range greater than 75%, and an average melting temperature greater than 750 DEG C., is made by deposition from vapour on to a substrate. Specified alloys are, in atomic percent, Cu, 35-65 Ag Cu, 20-90 Mg Au, 75 Mg Co, 17 or 50 Ag. Reference is also made to the production of the superconductive alloys NbSn and NbZr. The vacuum deposition apparatus shown is used for the production of a binary alloy by simultaneous evaporation of its components A, B from electrically heated sources 22, 24. Evaporation rates are controlled in response to ionization gauges 32, 34, and 50, 52. Charged particles are suppressed by grids 40, 42. The substrate, which may be a sapphire plate carrying a layer of collodion or silicon oxide, is mounted in liquid nitrogen-cooled housing 86, and its resistivity and temperature are monitored. The amorphous alloys have utility in thin film form for computer elements and control circuits.