公开(公告)号：US3796497A

公开(公告)日：1974-03-12

申请号：US3796497D

申请日：1971-12-01

Applicant: IBM

Inventor： MATHISEN E ,  MOORE R ,  SHEINER L

IPC: G01B11/00 ,  G02B7/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/26

CPC classification number: G03F9/70 ,  Y10S438/975

Abstract: An electro-optical mask and wafer alignment system employs alignment patterns on the mask and wafer whose images can be selectively passed through a spatial filter. Each pattern comprises at least two nonparallel lines. The alignment pattern configuration permits the X, Y coordinate locations of at least two corresponding points on the mask and wafer to be sensed by scanning the filtered images of the alignment patterns past a sensing device in a single direction. The mask and/or wafer are then positioned such that the signals generated from the alignment patterns indicate that the corresponding points on the mask and wafer are aligned.

Abstract translation: 电光掩模和晶片对准系统使用掩模和晶片上的对准图案，其图像可以选择性地通过空间滤光器。 每个图案包括至少两个不平行的线。 对准图案配置允许通过沿着单个方向扫描经过感测装置的对准图案的经滤波的图像来感测掩模和晶片上的至少两个对应点的X，Y坐标位置。 然后将掩模和/或晶片定位成使得从对准图案产生的信号指示掩模和晶片上的对应点对齐。