公开(公告)号：DE1521311A1

公开(公告)日：1969-08-21

申请号：DEI0028269

申请日：1965-06-02

Applicant: IBM

Inventor： LELAND CASWELL HOLLIS ,  VINCENT GREGOR LASRENCE ,  MCGEE HANSEL

IPC: B05D3/06 ,  B05D7/24 ,  C08F2/48 ,  C09D4/00 ,  C23C14/04 ,  H01G4/14 ,  H01J37/30 ,  H01L49/02

Abstract: A continuous thin film of material is vapour deposited on selected areas of a substrate having an organic surface, the selected areas on which deposition takes place being first irradiated in such a way that the sticking coefficient of these areas is greater than that of the remainder of the surface. The film materials deposited may be metals such as Sn, Pb, In, Ag or chemical compounds including semi-conductors such as PbS and CdS. The organic surface of the substrate may be formed by vapour depositing organic material such as silicone oil, bisphenal A-epichlorohydrin, resorcinol diglycidyl ether, methyl phenyl silaxane, or by adsorption of butyl methacrylate, vinyl acetate or methyl methacrylate to a thickness of 500 rA. The irradiation may be effected by electron beam or photolytically and the organic material is thus polymerized. The untreated i.e. unpolymerized portions of the organic surface may be polymerized by irradiation after deposition on the film material and a further outer layer of organic material may be vapour deposited on the film material. The process may be carried out in the apparatus shown in Figure 4. A substrate holder 29 pivoted on 31 in position A is located above evaporation sources 37, 39 and 41, is controlled by temperature regulators 42, and also exposed to electron beam from gun 43. The electron gun is programmed to supply the electron beam on substrate 9 in the required pattern after evaporation of the organic material from evaporator 41. Alternatively when holder 29 is rotated to position B the optical system 51 is used to effect photolytic polymerization in the required pattern; butyl methacrylate, vinyl acetate or methyl methacrylate in gaseous form being introduced at 59. The substrate may be cooled by coils 161. In the photolytic process it is preferred to illuminate the whole substrate surface with ultraviolet light to polymerize the surface and then to irradiate the selected areas with a light pattern of higher energy to produce the higher sticking coefficient. In an alternative method a negative pattern can be formed by using the irradiation to reduce the sticking coefficient of selected portions. Thus with a polymeric film of high sticking coefficient with a cover layer with only selected portions treated by the optical system 51, the pressure in the vacuum chamber may be reduced to desorb the unreacted portions of said cover layer to reexpose the previously deposited polymeric film.