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    Method and apparatus for aligning a photomask
    3.
    发明授权
    Method and apparatus for aligning a photomask 失效
    用于校正光电子的方法和装置

    公开(公告)号：US3645622A

    公开(公告)日：1972-02-29

    申请号：US3645622D

    申请日：1970-03-31

    Applicant: IBM

    Inventor： CACHON RENE P ,  GRUNDON FORREST R ,  MASTERSON FRANK H ,  MILLER JOSEPH C ,  WUSTRAU FRED E

    IPC: G03F7/20 ,  H01L21/68 ,  G03B27/02

    CPC classification number: G03F7/70691 ,  H01L21/682

    Abstract: Apparatus and method for accurately aligning a semiconductor wafer to a photomask, comprising a base and a frame for the apparatus. The base portion includes a chamber in which is mounted a piston which is restrained from lateral movement while permitting vertical reciprocation thereof. In the upper portion of the piston is a socket which supports a gimbal, the gimbal including a surface for receiving a wafer thereon. Mounted on the frame is a carriage which includes a mask clamp for positioning a mask in superimposed overlapping relation relative to the gimbal while clamping the mask to the frame. A source of fluid is connected to the socket so that the gimbal will float on a cushion, for example, of air. The piston is elevated by air pressure to cause the piston to raise beyond the point of contact of a wafer mounted on the gimbal with the mask. In response to the increase in fluid pressure which results from the contact of the wafer with the mask a sensor stops the air pressure to piston. Thereafter the piston is lowered a preset and predetermined amount to thereby space the wafer from the mask permitting adjustment of the base relative to the frame. Also disclosed is a novel gimbal with a wafer alignment apparatus build in so as to automatically initially position the wafer in a desired predetermined position on the gimbal.

    Abstract translation: 用于将半导体晶片精确对准到光掩模的装置和方法，包括用于该装置的基座和框架。 底座部分包括一个室，其中安装有活塞，该活塞在允许其垂直往复运动的同时被限制在横向运动中。 在活塞的上部是支撑万向节的插座，万向架包括用于在其上接收晶片的表面。 安装在框架上的是一种托架，其包括用于将掩模相对于万向架叠加重叠的关系定位的掩模夹具，同时将掩模夹在框架上。 流体源连接到插座，使得万向架将浮在例如空气的垫子上。 活塞通过空气压力升高以使活塞升高超过安装在万向节上的晶片与面罩的接触点。 响应于晶片与面罩的接触导致的流体压力的增加，传感器将空气压力停止到活塞。 此后，活塞降低预设和预定量，从而使晶片与掩模相隔离，允许基座相对于框架的调节。

    WAFER INTERLOCKING TRANSPORT SYSTEM
    5.
    发明专利
    WAFER INTERLOCKING TRANSPORT SYSTEM 未知

    公开(公告)号：CA996144A

    公开(公告)日：1976-08-31

    申请号：CA184337

    申请日：1973-10-26

    Applicant: IBM

    Inventor： APPENZELLER HENRY A ,  MILLER JOSEPH C ,  SHEA VINCENT

    IPC: B23Q3/08 ,  B21D43/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/304 ,  H01L21/673

    Abstract: A wafer transport apparatus to lock and hold a wafer in a predetermined contoured position while permitting transport of the wafer from the contouring apparatus to a remote location for further processing on the contoured wafer surface. The apparatus comprises a pallet having a plurality of pedestals therein, and vacuum cups at one extended end of the pedestals for supporting and gripping a wafer thereon. Means are provided to permit reciprocation of individual ones of the pedestals in the pallet, when the pallet is positioned in the contouring apparatus, and pedestal locks are provided to grasp and lock individual ones of the pedestals in an individually determinable position, while holding the pedestals in that position so that the pallet may be removed from the apparatus and positioned at some remote station.

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