公开(公告)号：DE2860442D1

公开(公告)日：1981-02-26

申请号：DE2860442

申请日：1978-11-10

Applicant: IBM

Inventor： SHEA VINCENT ,  WOJCIK WALTER JOSEPH

IPC: G03F1/62 ,  G03F7/20 ,  H01L21/027 ,  G03B41/00 ,  G03F1/00 ,  G03F7/26

Abstract: In a projection printing system the pattern mask, whose image is projected onto a light sensitive layer, is protected with a thin, 0.2-6 micron thick, transparent film or pellicle which is positioned an optically large distance of about 1-125 mm from the mask surface by a spacer member. Any dirt particles on the surface of the pellicle will be out of focus and are not printed in the light sensitive layer. A pellicle can also be employed to protect the light sensitive layer at the image plane.

公开(公告)号：DE2356954A1

公开(公告)日：1974-05-30

申请号：DE2356954

申请日：1973-11-15

Applicant: IBM

Inventor： APPENZELLER HENRY ALBERT ,  MILLER JOSEPH CHARLES ,  SHEA VINCENT

IPC: B23Q3/08 ,  B21D43/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/304 ,  H01L21/673 ,  B25B11/00 ,  B23Q3/06

Abstract: A wafer transport apparatus to lock and hold a wafer in a predetermined contoured position while permitting transport of the wafer from the contouring apparatus to a remote location for further processing on the contoured wafer surface. The apparatus comprises a pallet having a plurality of pedestals therein, and vacuum cups at one extended end of the pedestals for supporting and gripping a wafer thereon. Means are provided to permit reciprocation of individual ones of the pedestals in the pallet, when the pallet is positioned in the contouring apparatus, and pedestal locks are provided to grasp and lock individual ones of the pedestals in an individually determinable position, while holding the pedestals in that position so that the pallet may be removed from the apparatus and positioned at some remote station.

公开(公告)号：CA996144A

公开(公告)日：1976-08-31

申请号：CA184337

申请日：1973-10-26

Applicant: IBM

Inventor： APPENZELLER HENRY A ,  MILLER JOSEPH C ,  SHEA VINCENT

IPC: B23Q3/08 ,  B21D43/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/304 ,  H01L21/673

Abstract: A wafer transport apparatus to lock and hold a wafer in a predetermined contoured position while permitting transport of the wafer from the contouring apparatus to a remote location for further processing on the contoured wafer surface. The apparatus comprises a pallet having a plurality of pedestals therein, and vacuum cups at one extended end of the pedestals for supporting and gripping a wafer thereon. Means are provided to permit reciprocation of individual ones of the pedestals in the pallet, when the pallet is positioned in the contouring apparatus, and pedestal locks are provided to grasp and lock individual ones of the pedestals in an individually determinable position, while holding the pedestals in that position so that the pallet may be removed from the apparatus and positioned at some remote station.