公开(公告)号：DE68907491D1

公开(公告)日：1993-08-19

申请号：DE68907491

申请日：1989-01-12

Applicant: IBM

Inventor： MINE SHINGI ,  MIWA YOICHI ,  ONO HIROYUKI

IPC: G11B21/08 ,  G11B21/10

Abstract: In order to write a servo pattern on each of a plurality of record disks (18, 62) in a data storage device, first and second base patterns (51, 52) are first written on one (18) of the disks. The first base pattern (51) comprises a series of portions spaced along one radius of the disk, an individual one of the portions being situated at each track centre. The second base pattern (52) comprises a set of pattern portions, an individual one of the portions lying substantially continuously over each radius of a plurality of radii defining the positions of servo sectors. A sector servo pattern is then written on each of the record surfaces of the disks (18, 62) under control provided by detection of the base patterns (51, 52) on the one disk (18). The latter operation of writing the sector servo patterns on the disks need not be performed in a clean room.

公开(公告)号：CA1317373C

公开(公告)日：1993-05-04

申请号：CA592100

申请日：1989-02-03

Applicant: IBM

Inventor： MINE SHINGI ,  MIWA YOICHI ,  ONO HIROYUKI

IPC: G11B21/08 ,  G11B21/10 ,  G11B5/596

Abstract: The present disclosure teaches a method of writing servo patterns for increased productivity. The process for writing servo patterns is divided into a pre-operation carried out before disks are installed into a disk device (fixed to the spindle shaft) and a post-operation that is carried out after the installation. In the pre-operation, patterns written on the recording surface of the disk are two base patterns, namely, (a) a first base pattern arranged on each track center along one radial direction of the disk and (b) a second base pattern arranged along the radial direction at each position corresponding to the position of the sector in a substantially continuous fashion. Then, the disks are assembled or installed into the disk device together with blank disks. In the post-operation, the servo patterns are written based on the first and second base patterns. Here, the expression "substantially continuous fashion" also includes the case where the number of discontinuous portions is smaller than that of the first base pattern even if some discontinuous portions are present in the base pattern, besides the case where the base pattern is completely continuous along the radial direction. JA9-87-020