公开(公告)号：DE3485005D1

公开(公告)日：1991-10-10

申请号：DE3485005

申请日：1984-06-20

Applicant: IBM

Inventor： OLSEN BEVERLY LOUISE ,  OUANO AUGUSTUS CENIZA

IPC: C08K5/10 ,  C08L81/00 ,  C08L81/02 ,  C08L81/06 ,  G03F7/038 ,  G03F7/09 ,  G03F7/26 ,  H01L21/027 ,  H01L21/3205 ,  H05K3/14 ,  H01L21/312 ,  H01L21/28

Abstract: A composition for use as a masking material, most advantageously as a loft-off mask, that is stable after exposure to high intensity radiation environments formed of a polyaryl sulfone polymer, and a compound of the chemical formula wherein R1 is a methyl, ethyl, or an alpha -branched alkyl group of from 3 to 10 carbon atoms, X has avalue of from 1 to 6 and Z is an aliphatic hydrocarbon of the formula C5H8, wherein the compound is present in the mixture in an amount in the range of 0.1 to 5.0% by weight of the composition is described. The composition is used in a lift-off process for depositing a metallurgy pattern on a substrate.