公开(公告)号：AU3883878A

公开(公告)日：1980-02-14

申请号：AU3883878

申请日：1978-08-11

Applicant: IBM

Inventor： CAROTHERS JAMES ALBERT ,  ECONOMY JAMES ,  OUANO AUGUSTUS CENIZA

IPC: H01L21/30 ,  G03C1/72 ,  G03F7/022 ,  G03F7/30 ,  G03F7/32 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H05K3/06 ,  G03C1/54 ,  G03F7/10

公开(公告)号：DE2860333D1

公开(公告)日：1981-03-12

申请号：DE2860333

申请日：1978-10-13

Applicant: IBM

Inventor： CAROTHERS JAMES ALBERT ,  ECONOMY JAMES ,  OUANO AUGUSTUS CENIZA

IPC: H01L21/30 ,  G03C1/72 ,  G03F7/022 ,  G03F7/30 ,  G03F7/32 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H05K3/06 ,  G03F7/08

公开(公告)号：DE3485005D1

公开(公告)日：1991-10-10

申请号：DE3485005

申请日：1984-06-20

Applicant: IBM

Inventor： OLSEN BEVERLY LOUISE ,  OUANO AUGUSTUS CENIZA

IPC: C08K5/10 ,  C08L81/00 ,  C08L81/02 ,  C08L81/06 ,  G03F7/038 ,  G03F7/09 ,  G03F7/26 ,  H01L21/027 ,  H01L21/3205 ,  H05K3/14 ,  H01L21/312 ,  H01L21/28

Abstract: A composition for use as a masking material, most advantageously as a loft-off mask, that is stable after exposure to high intensity radiation environments formed of a polyaryl sulfone polymer, and a compound of the chemical formula wherein R1 is a methyl, ethyl, or an alpha -branched alkyl group of from 3 to 10 carbon atoms, X has avalue of from 1 to 6 and Z is an aliphatic hydrocarbon of the formula C5H8, wherein the compound is present in the mixture in an amount in the range of 0.1 to 5.0% by weight of the composition is described. The composition is used in a lift-off process for depositing a metallurgy pattern on a substrate.

公开(公告)号：DE3062249D1

公开(公告)日：1983-04-14

申请号：DE3062249

申请日：1980-03-20

Applicant: IBM

Inventor： BALANSON RICHARD DAVID ,  CLECAK NICHOLAS JEFFRIES ,  GRANT BARBARA DIANNE ,  OUANO AUGUSTUS CENIZA

IPC: G03C1/72 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/08