公开(公告)号：CA1132825A

公开(公告)日：1982-10-05

申请号：CA349767

申请日：1980-04-14

Applicant: IBM

Inventor： BALANSON RICHARD D ,  CLECAK NICHOLAS J ,  GRANT BARBARA D ,  OUANO AUGUSTUS C

IPC: G03C1/72 ,  G03F7/016 ,  G03F7/038 ,  G03F7/039 ,  G03F7/02

Abstract: Phenolic-aldehyde resins sensitized with Meldrum's diazo or an analog thereof are useful as lithographic resists sensitive to deep ultra-violet light.

公开(公告)号：CA1120763A

公开(公告)日：1982-03-30

申请号：CA308258

申请日：1978-07-27

Applicant: IBM

Inventor： CAROTHERS JAMES A ,  ECONOMY JAMES ,  OUANO AUGUSTUS C

IPC: H01L21/30 ,  G03C1/72 ,  G03F7/022 ,  G03F7/30 ,  G03F7/32 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H05K3/06 ,  G03G9/16

Abstract: ENHANCEMENT OF RESIST DEVELOPMENT The present invention is concerned with enhancement of resist development. In particular it is concerned with obtaining high solubility rate ratio between the exposed and the unexposed regions of a resist and also obtaining shorter development time. These objectives are achieved by treating the resist with a liquid trialkylamine having from two to eight carbon atoms in each alkyl group.