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公开(公告)号:JPS61223837A
公开(公告)日:1986-10-04
申请号:JP28953985
申请日:1985-12-24
Applicant: IBM
Inventor: CLECAK NICHOLAS J , GRANT BARBARA D , MILLER ROBERT D , TOMPKINS TERRY C , WILLSON CARLTON G
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公开(公告)号:CA1132825A
公开(公告)日:1982-10-05
申请号:CA349767
申请日:1980-04-14
Applicant: IBM
Inventor: BALANSON RICHARD D , CLECAK NICHOLAS J , GRANT BARBARA D , OUANO AUGUSTUS C
Abstract: Phenolic-aldehyde resins sensitized with Meldrum's diazo or an analog thereof are useful as lithographic resists sensitive to deep ultra-violet light.
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公开(公告)号:CA1081350A
公开(公告)日:1980-07-08
申请号:CA322303
申请日:1979-02-26
Applicant: IBM
Inventor: CLECAK NICHOLAS J , GRANT BARBARA D , JAFFE ANNETTE B , KELLER GARY S
Abstract: ELECTROCHROMIC DISPLAY DEVICES COMPRISING SUBSTITUTED FLUORENE COMPOUNDS Electrochromic display devices having very desirable stability and reversibility are obtained using as the oxidant certain fluorene compounds substituted with at least two alkoxy groups per molecule. The display device comprises a reactive medium between two electrically conductive electrodes at least one of which is transparent. The reactive medium comprises an anhydrous solvent and an oxidant/reductant pair.
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公开(公告)号:CA1221864A
公开(公告)日:1987-05-19
申请号:CA499173
申请日:1986-01-08
Applicant: IBM
Inventor: CLECAK NICHOLAS J , GRANT BARBARA D , MILLER ROBERT D , TOMPKINS TERRY C , WILLSON C GRANT
IPC: C08L101/00 , C08K5/00 , C08K5/53 , C08L33/00 , C08L33/02 , C08L61/10 , G03C1/72 , G03C5/16 , G03F7/016 , G03F7/038 , G03F7/039 , G03F7/20 , H01L21/027 , G03C1/54
Abstract: HIGH-CONTRAST, HIGH RESOLUTION DEEP ULTRAVIOLET LITHOGRAPHIC RESISTS A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
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公开(公告)号:CA1156458A
公开(公告)日:1983-11-08
申请号:CA381202
申请日:1981-07-06
Applicant: IBM
Inventor: GENDLER PAUL L , GRANT BARBARA D , SNYDER CLINTON D
IPC: G01D15/06
Abstract: ELECTROCHROMIC RECORDING PAPER A medium for electrochromic recording is provided by treating paper with a water soluble leuco methylene blue compound having the formula wherein R is a sulfonated aromatic or sulfonated aliphatic moiety. SA980013
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公开(公告)号:CA1122467A
公开(公告)日:1982-04-27
申请号:CA361713
申请日:1980-10-07
Applicant: IBM
Inventor: CLECAK NICHOLAS J , GRANT BARBARA D , WILLSON C GRANT
IPC: G03C1/72 , C08K5/1575 , C08L61/00 , C08L61/04 , C08L61/06 , G03C1/00 , G03F7/004 , G03F7/016 , G03F7/022 , G03F7/038 , G03F7/26 , H01L21/26 , G03C1/52 , B41M
Abstract: Lithographic resist compositions are provided which permit an improved lift-off process in which the deposition mask with apertures has the desirable negative slope or overhang. The resist composition comprises a phenolic-aldehyde resin, a photosensitizer and Meldrum's diazo, or Meldrum's acid or suitable analogs thereof as a profile modifying agent. The profile modifying agents useful in the present invention have the formula: wherein R1 is C1 to C20 alkyl or aryl, R2 is H, C1 to C20 alkyl or aryl, or together R1 and R2 are cycloalkyl, A is N or H.
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