公开(公告)号：JPH06266106A

公开(公告)日：1994-09-22

申请号：JP26083793

申请日：1993-10-19

Applicant: IBM

Inventor： ROBAATO DEIBITSUDO AREN ,  UIRAADO AARU KONREE JIYUNIA ,  UIRIAMU DEIINAN HINZUBAAGU ZA ,  PAMERA II JIYOONZU ,  KEBIN EMU UERUSHIYU

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30 ,  H05K3/00

Abstract: PURPOSE: To increase difference in solubility after exposure by using a radiation sensitive acid generating agent, a polymer binder soluble in an aq. base and a specified copolymer. CONSTITUTION: This radiation sensitive resist compsn. consists of a radiation sensitive acid generating agent, a binder soluble in an aq. base and an acid- unstable copolymer contg. a reactional product of acrylic acid, methacrylic acid or a mixture of them with alkyl methacrylate, alkyl acrylate or a mixture of them and a monomer having an acid-unstable dangling group. The principal component in this resist compsn. is the copolymer contg. 1-20wt.% acrylic acid, methacrylic acid or mixture of them, 35-65wt.% methacrylate, acrylate or mixture of them and 15-50wt.% monomer having an acid-unstable group. The kinds of the monomers in the copolymer and their amts. depend on the desired characteristics of the copolymer.