公开(公告)号：JPH06266106A

公开(公告)日：1994-09-22

申请号：JP26083793

申请日：1993-10-19

Applicant: IBM

Inventor： ROBAATO DEIBITSUDO AREN ,  UIRAADO AARU KONREE JIYUNIA ,  UIRIAMU DEIINAN HINZUBAAGU ZA ,  PAMERA II JIYOONZU ,  KEBIN EMU UERUSHIYU

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30 ,  H05K3/00

Abstract: PURPOSE: To increase difference in solubility after exposure by using a radiation sensitive acid generating agent, a polymer binder soluble in an aq. base and a specified copolymer. CONSTITUTION: This radiation sensitive resist compsn. consists of a radiation sensitive acid generating agent, a binder soluble in an aq. base and an acid- unstable copolymer contg. a reactional product of acrylic acid, methacrylic acid or a mixture of them with alkyl methacrylate, alkyl acrylate or a mixture of them and a monomer having an acid-unstable dangling group. The principal component in this resist compsn. is the copolymer contg. 1-20wt.% acrylic acid, methacrylic acid or mixture of them, 35-65wt.% methacrylate, acrylate or mixture of them and 15-50wt.% monomer having an acid-unstable group. The kinds of the monomers in the copolymer and their amts. depend on the desired characteristics of the copolymer.

公开(公告)号：JPH05249680A

公开(公告)日：1993-09-28

申请号：JP20784692

申请日：1992-08-04

Applicant: IBM

Inventor： ROBAATO DEIBITSUDO AREN ,  UIRIAMU ROSU BURANZUBOURUDO ,  BAATON JIESHII KAAPENTAA ,  UIRIAMU DEIINAN HINZUBAAGU ,  JIYOZEFU RATOORE ,  MAIKURU JIYOOJI MAKUMASUTAA ,  MERUBIN UOREN MONTOGOMERII ,  UEIN MAATEIN MOROO ,  ROOGAN ROIDO SHINPUSON ,  ROBAATO JIEIMUZU TOUEIGU ,  GUREGORII MAIKURU UOORURAFU

IPC: G03F7/004 ,  C08F2/50 ,  G03F7/039 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE: To obtain a positive photoresist and to provide a photolithographic method using the photoresist. CONSTITUTION: This photoresist contains a polymer practically insoluble in water and base and unstable to light and a photo-acid generating agent capable of forming a strong acid. The photo-acid generating agent is sulfonate ester derived from N-hydroxyamide or N-hydroxyimide. This photoresist further contains a proper photosensitizer.

公开(公告)号：JPH04230758A

公开(公告)日：1992-08-19

申请号：JP8115291

申请日：1991-03-22

Applicant: IBM

Inventor： ROBAATO DEIBITSUDO AREN ,  GUREGORII MAIKURU UOORURAFU ,  ROOGAN ROIDO SHINPUSON ,  UIRIAMU DAINAN HINZUBAAGU ZASA

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To enable aqueous processing in a dry film type by consisting of a polymer binder produced from tert-butyl methacrylate/methyl methacrylate/ acrylic acid/ethyl acrylate and an initiator. CONSTITUTION: This photoresist composition consists of the film forming polymer binder and the initiator generating an acid by the exposure with radiation. The polymer chain of the polymer binder is controlled to be composed of next polymerizing units: (1) a 1st monomer giving an acid sensitive side chain group to the polymer main chain, (2) a 2nd monomer selected from a group composed of an alkyl methacrylate, an acrylate and the combination and (3) a 3rd monomer selected from a group composed of an acrylate based carboxylic acid and an methacylate based carboxylic acid. As a result, the photoresist composition is capable of forming a rigid film, executing deprotective chemical change by an acid catalyst, forming an image with high resolution and being developed with sodium carbonate/water.

公开(公告)号：JPH04226461A

公开(公告)日：1992-08-17

申请号：JP8115391

申请日：1991-03-22

Applicant: IBM

Inventor： ROBAATO DEIBITSUDO AREN ,  GUREGORII MAIKURU UOORURAFU ,  ROOGAN ROIDO SHINPUSON ,  UIRIAMU DAINAN HINZUBAAGU ZASA

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/039 ,  G03F7/26 ,  H05K3/06

Abstract: PURPOSE: To obtain the photoresist having high sensitivity and high resolution by using a (tertiary-butyl methacrylate)/(methyl methacrylate)/(methacrylic acid) polymer binder and an initiator that generates an acid when it is exposed to radiation, as components of the composition. CONSTITUTION: In this composition, the film-forming polymer binder used is an acrylic polymer that has acid-convertible side chains and is capable of forming a photoresist by allowing it to react with a selected luminescent agent through chemical-sensitizing reaction. Polymer chains of the polymer binder consist of a first monomer that provides a polymer main chain with the acid- sensitive side chain groups, a second monomer that is selected from alkyl methacrylates, alkyl acrylates and combinations of them, and a third monomer that is selected from acryl-based carboxylic acids and methacryl-based carboxylic acids.

公开(公告)号：JPH03200257A

公开(公告)日：1991-09-02

申请号：JP31817190

申请日：1990-11-26

Applicant: IBM

Inventor： ROBAATO DEIBITSUDO AREN ,  UIRIAMU DAINAN HINZUBAAGU ZA S ,  ROOGAN ROIDO SHINPUSON ,  ROBAATO JIEIMUZU TOUIIGU ,  GUREGORII MAIKURU UOORURAFU ,  KAARUTON GURANTO UIRUSON

IPC: C08F8/00 ,  C08G59/00 ,  C08G59/18 ,  C08G59/68 ,  G03C1/675 ,  G03F7/004 ,  G03F7/031 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To directly form an image with visible light or laser light by using a specified sensitizer and an initiator generating an acid when exposed with radiation in the presence of the sensitizer. CONSTITUTION: This photosensitive acid generating compsn. consists of an arom. iodonium salt as an initiator and a sensitizer represented by formula I, wherein each of R1 , R2 , X and Y is a nonbasic substituent selected from among alkyl, alkoxy, trialkylsilyl and about 4-20C optionally substd. arom. groups. This sensitizer-photoinitiator system consists preferably of the arom. iodonium salt and 1,8-dimethoxy-9,10-bis(phenylethynyl)anthracene as a sensitizer. An image can directly be formed with visible light or laser light.