公开(公告)号：DE3171231D1

公开(公告)日：1985-08-08

申请号：DE3171231

申请日：1981-09-16

Applicant: IBM

Inventor： MACK ALFRED ,  O'NEILL BRIAN COLLINS ,  PENZETTA FRED L

IPC: H01J37/20 ,  H01J37/18 ,  H01L21/027 ,  H01L21/66

Abstract: This invention is directed to mechanisms for sealing off a small volume antechamber (36) from a main vacuum chamber (10) forming a component of an electron beam writing system. The mechanisms eliminate shock and vibration transmission to an electron beam column (4) to permit electron beam writing in parallel with and simultaneously with a load/unload operation involving the antechamber. The mechanism comprise mechanical override means (62) for dampening impact during sealing and means (84, 136) for preventing vibration transfer.