公开(公告)号：JP2002060979A

公开(公告)日：2002-02-28

申请号：JP2001117072

申请日：2001-04-16

Applicant: IBM

Inventor： TORISHIA L BREEN ,  PETA FRYER ,  RONALD WAYNE NUNES ,  MARY ELIZABETH ROTHWELL

IPC: B41K3/00 ,  C01G15/00 ,  C01G19/00 ,  C23C30/00 ,  G02F1/1333 ,  G03F7/00 ,  G03F7/16

Abstract: PROBLEM TO BE SOLVED: To provide a depositing method of a self-aggregate single molecule layer on a metal oxide using the micro-contact printing in the patterning substantially of the derivative and the surface, and a derivative substance manufactured thereby. SOLUTION: In the method for depositing a patterned film of IZO or ITO by the micro-contact printing and etching, a stamp is brought into contact with a surface of the IZO or ITO film to transfer the self-aggregate single molecule layer of the molecular kind of a fist pattern. The self-aggregate single molecule layer is continuous to an exposed portion of the IZO or ITO film surface of a second pattern. The IZO or ITO film chemically reacts with IZO or ITO. The self-aggregate single molecule layer is removed from a lower substrate following the second pattern by bringing the inert etchant into contact with the exposed portion of the IZO or ITO film.