公开(公告)号：BR9101512A

公开(公告)日：1991-12-03

申请号：BR9101512

申请日：1991-04-15

Applicant: IBM

Inventor： HAKEY MARK C ,  HORAK DAVID V ,  RATH PETER C

IPC: G11B21/02 ,  G11B21/21 ,  G11B19/20

Abstract: An actuator comprises a slotted stator which is mounted in a stator frame. The stator is connected to the frame by attachment means which allows the stator to move rotationally, axially and laterally relative to the frame without distorting the dimensions of the stator. The stator has an air bearing outer surface which receives a slider. A head arm assembly is attached to the slider such that the head arm assembly may be completely positioned within the stator slot when the slider is fully retracted.

公开(公告)号：CA2037705A1

公开(公告)日：1991-10-19

申请号：CA2037705

申请日：1991-03-07

Applicant: IBM

Inventor： HAKEY MARK C ,  HORAK DAVID V ,  RATH PETER C

IPC: G03F1/00 ,  G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  H01L21/30

Abstract: METHOD AND APPARATUS FOR ENHANCING THE DEPTH OF FOCUS IN PROJECTION LITHOGRAPHY The invention provides a technique which enables projection lithography to extend to the sub-half micron range by compensating the Depth of Focus (DOF) budget lost in substrate topography with a projection of a non-planar image which is conformal to the substrate. The method of achieving a non-planar image field includes the formation of a mask reticle which is a replica of the surface of the semiconductor to be exposed, thus, eliminating substrate topography from the optical DOF budget.