公开(公告)号：JPS6320485A

公开(公告)日：1988-01-28

申请号：JP9216287

申请日：1987-04-16

Applicant: IBM

Inventor： DONARUDO JIIN MAKUBURAIDO ,  ROBAATO JIYOOJI RITSUKAATO

IPC: C23C18/31 ,  C23C18/16 ,  C23C18/40 ,  H05K3/18

Abstract: An electroless plating bath (11) is selectively cleaned of organic contaminants. The organic contaminants are detected by measuring the capacitance between a working electrode (26) and counter electrode (27) with a potentiostat (31). The capacitance measurements are used to indicate the level of organic contaminants. Exposure of the dummy plating surface (39) in the electroless plating bath is controlled such that the exposed surface is directly proportional to the detected level of organic contaminants.

公开(公告)号：JPS62158882A

公开(公告)日：1987-07-14

申请号：JP27310086

申请日：1986-11-18

Applicant: IBM

Inventor： PIITAA ARAN BAANETSUTO ,  DAA YANGU JIYUNGU ,  RONARUDO ANSONII KASUCHIYATSUK ,  ROI HAABII MAGUNUSON ,  ROBAATO JIYOOJI RITSUKAATO ,  SUCHIIBUN REO CHISUDEERU

IPC: C23C18/38 ,  C23C18/40 ,  H05K3/18