公开(公告)号：DE3367483D1

公开(公告)日：1986-12-11

申请号：DE3367483

申请日：1983-01-14

Applicant: IBM

Inventor： CORTELLINO CHARLES ANTHONY ,  LEVINE JOSEPH ELI ,  SCHICK HENRY CARL

IPC: H01L21/30 ,  G03F7/30 ,  H01L21/027 ,  H01L21/68 ,  H01L21/312 ,  G03F7/26 ,  G03D3/00 ,  H05K3/14

Abstract: A developer apparatus comrises a developing tank (10) arranged with a centrally located rotatable and vertically translatable shaft (20) carrying a workpiece platform (12) at the upper end thereof. Initially, the platform is located above the tank for ease in loading a workpiece, for example an exposed photoresist coated semiconductor device component. The platform and workpiece are then lowered into developing solution in the tank where they are rotated and oscillated vertically for agitational action during a predetermined time period after which they are raised up out of the solution and delayed with continued rotation at a drying station for another predetermined time period. Thereafter, the platform and workpiece are returned to the initial position for workpiece unloading.

公开(公告)号：DE3661546D1

公开(公告)日：1989-02-02

申请号：DE3661546

申请日：1986-04-18

Applicant: IBM

Inventor： MAC KINNON DONALD ANGUS ,  LI PEI CHING ,  SCHICK HENRY CARL

IPC: C23C16/34 ,  C23C8/36 ,  C23C16/02 ,  C23C28/00 ,  C23C28/04

公开(公告)号：DE3270169D1

公开(公告)日：1986-04-30

申请号：DE3270169

申请日：1982-12-02

Applicant: IBM

Inventor： NARKEN BERNT ,  SCHICK HENRY CARL

IPC: G03F1/00 ,  H01L21/027 ,  G03F7/26 ,  G03F7/02

Abstract: The invention relates to an integrated circuit photomask. The photomask is formed of a transparent dielectric substrate (1), such as glass and quartz based substrates, and has a conductive surface adjacent region (3), which is patterned with sequential overcoatings of a composite chrome oxide layer (5) and a chrome film (6). The mask comprises a combination of varied reflectivities to provide proper densities for the opaque areas of the mask.